Issued Patents All Time
Showing 26–50 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9671694 | Wet strippable gap fill materials | Martin Glodde, Ratnam Sooriyakumaran, Hoa D. Truong | 2017-06-06 |
| 9627204 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | Tsutomu Ogihara, Takafumi Ueda, Yoshinori Taneda | 2017-04-18 |
| 9580623 | Patterning process using a boron phosphorus silicon glass film | Yoshinori Taneda, Rie Kikuchi, Tsutomu Ogihara, Yoshio Kawai, Karen E. Petrillo +1 more | 2017-02-28 |
| 9522979 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | Takeru Watanabe, Yoshinori Taneda, Tsutomu Ogihara | 2016-12-20 |
| 9460934 | Wet strip process for an antireflective coating layer | Martin Glodde, Wu-Song Huang, Javier Perez, Takeshi Kinsho, Tsutomu Ogihara +1 more | 2016-10-04 |
| 9377690 | Compositon for forming metal oxide-containing film and patterning process | Tsutomu Ogihara, Takafumi Ueda, Yoshinori Taneda | 2016-06-28 |
| 9372404 | Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer | Takeru Watanabe, Toshihiko Fujii, Kazumi Noda, Toshiharu Yano, Takeshi Kinsho | 2016-06-21 |
| 9312127 | Method for producing semiconductor apparatus substrate | Tsutomu Ogihara, Daisuke KORI, Yoshinori Taneda, Yusuke Biyajima, Rie Kikuchi | 2016-04-12 |
| 9274425 | Resist composition and patterning process | Jun Hatakeyama, Kazuhiro Katayama | 2016-03-01 |
| 9261788 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda, Toshiharu Yano | 2016-02-16 |
| 9233919 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Youichi Ohsawa, Masaki Ohashi, Jun Hatakeyama | 2016-01-12 |
| 9230827 | Method for forming a resist under layer film and patterning process | Shiori Nonaka, Daisuke KORI, Toshihiko Fujii, Tsutomu Ogihara | 2016-01-05 |
| 9188866 | Composition for forming titanium-containing resist underlayer film and patterning process | Tsutomu Ogihara, Takafumi Ueda, Yoshinori Taneda | 2015-11-17 |
| 9176382 | Composition for forming titanium-containing resist underlayer film and patterning process | Tsutomu Ogihara, Takafumi Ueda, Yoshinori Taneda | 2015-11-03 |
| 9091933 | Negative pattern forming process | Tomohiro Kobayashi, Kazuhiro Katayama, Jun Hatakeyama, Kenji Funatsu | 2015-07-28 |
| 9069245 | Near-infrared absorptive layer-forming composition and multilayer film | Masaki Ohashi, Kazumi Noda, Shozo Shirai, Takeshi Kinsho, Wu-Song Huang +3 more | 2015-06-30 |
| 9046764 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | Daisuke KORI, Tsutomu Ogihara, Kazumi Noda, Takeshi Kinsho | 2015-06-02 |
| 9017918 | Monomer, polymer, chemically amplified positive resist composition, and patterning process | Jun Hatakeyama, Koji Hasegawa | 2015-04-28 |
| 8999625 | Silicon-containing antireflective coatings including non-polymeric silsesquioxanes | Martin Glodde, Wu-Song Huang, Javier Perez, Ratnam Sooriyakumaran, Takeshi Kinsho +2 more | 2015-04-07 |
| 8791290 | Acetal compound, polymer, resist composition, and patterning process | Koji Hasegawa, Jun Hatakeyama, Takeshi Nagata, Takeshi Kinsho | 2014-07-29 |
| 8791288 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | Takeshi Kinsho, Tomohiro Kobayashi, Masayoshi Sagehashi, Takeru Watanabe, Koji Hasegawa | 2014-07-29 |
| 8785105 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Youichi Ohsawa, Masaki Ohashi, Jun Hatakeyama | 2014-07-22 |
| 8759220 | Patterning process | Tsutomu Ogihara, Takafumi Ueda, Yoshinori Taneda, Martin Glodde, Margaret C. Lawson +1 more | 2014-06-24 |
| 8722307 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | Kazumi Noda, Masaki Ohashi, Takeshi Kinsho, Wu-Song Huang, Dario L. Goldfarb +2 more | 2014-05-13 |
| 8501384 | Positive resist composition and patterning process | Jun Hatakeyama, Takeru Watanabe | 2013-08-06 |