TO

Tsutomu Ogihara

SC Shin-Etsu Chemical Co.: 184 patents #5 of 2,176Top 1%
IBM: 8 patents #13,150 of 70,183Top 20%
SE Seiko Epson: 4 patents #3,385 of 7,774Top 45%
Sumitomo Electric Industries: 4 patents #6,367 of 21,551Top 30%
PA Panasonic: 2 patents #9,678 of 21,108Top 50%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
📍 Joetsu, JP: #4 of 239 inventorsTop 2%
Overall (All Time): #3,714 of 4,157,543Top 1%
191
Patents All Time

Issued Patents All Time

Showing 26–50 of 191 patents

Patent #TitleCo-InventorsDate
11231649 Patterning process Tsukasa Watanabe 2022-01-25
11181821 Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer Daisuke KORI, Takeru Watanabe, Keisuke NIIDA, Takashi SAWAMURA 2021-11-23
11042090 Composition for forming organic film Seiichiro Tachibana, Hiroko Nagai, Daisuke KORI 2021-06-22
11022882 Compound and composition for forming organic film Seiichiro Tachibana, Takeru Watanabe, Keisuke NIIDA, Hiroko Nagai, Takashi SAWAMURA +4 more 2021-06-01
11018015 Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process Daisuke KORI, Seiichiro Tachibana, Yusuke Biyajima, Naoki Kobayashi, Kazumi Noda 2021-05-25
11005421 Circuit device, oscillator, electronic apparatus, and vehicle 2021-05-11
10998197 Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process Daisuke KORI, Takeru Watanabe, Keisuke NIIDA, Takashi SAWAMURA 2021-05-04
10811247 Method of cleaning and drying semiconductor substrate Osamu Watanabe, Takeshi Nagata, Naoki Kobayashi, Daisuke KORI 2020-10-20
10620537 Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition Takeru Watanabe, Rie Kikuchi, Daisuke KORI, Yusuke Biyajima 2020-04-14
10615045 Composition for forming organic film, patterning process, and resin for forming organic film Daisuke KORI 2020-04-07
10610906 Method for manufacturing a resist composition Motoaki Iwabuchi, Yukio Hoshi, Yusuke Biyajima 2020-04-07
10604618 Compound, method for manufacturing the compound, and composition for forming organic film Seiichiro Tachibana, Takeru Watanabe, Keisuke NIIDA, Hiroko Nagai, Takashi SAWAMURA +4 more 2020-03-31
10603696 Process for manufacturing resist composition and patterning process Motoaki Iwabuchi 2020-03-31
10591817 Method for producing composition for forming coating film for lithography and patterning process Motoaki Iwabuchi 2020-03-17
10545165 Physical quantity detection circuit, physical quantity detector, electronic apparatus and moving object 2020-01-28
10514605 Resist multilayer film-attached substrate and patterning process Seiichiro Tachibana, Hiroko Nagai, Romain Lallement, Karen E. Petrillo 2019-12-24
10444628 Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process Daisuke KORI, Takeru Watanabe, Yoshinori Taneda, Kazunori Maeda 2019-10-15
10429739 Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process Daisuke KORI, Takeru Watanabe, Yoshinori Taneda, Rie Kikuchi 2019-10-01
10416563 Resist underlayer film composition, patterning process, and method for forming resist underlayer film Hironori Satoh, Hiroko Nagai, Takeru Watanabe, Daisuke KORI 2019-09-17
10241412 Resist underlayer film composition, patterning process, and method for forming resist underlayer film Hiroko Nagai, Takeru Watanabe, Daisuke KORI 2019-03-26
10228621 Underlayer film-forming composition and pattern forming process Jun Hatakeyama, Daisuke KORI 2019-03-12
10156788 Resist underlayer film composition, patterning process, and compound Jun Hatakeyama, Daisuke KORI 2018-12-18
10131603 Method for reducing metal of sugar-alcohol compound and sugar-alcohol compound Takayoshi NAKAHARA, Takeru Watanabe, Seiichiro Tachibana 2018-11-20
10109485 Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process Keisuke NIIDA, Yasuyuki Yamamoto 2018-10-23
10047244 Method for producing a composition for forming an organic film Daisuke KORI, Motoaki Iwabuchi 2018-08-14