Issued Patents All Time
Showing 76–100 of 191 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9261788 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Takeru Watanabe, Kazumi Noda, Toshiharu Yano | 2016-02-16 |
| 9248693 | Patterning process | — | 2016-02-02 |
| 9230827 | Method for forming a resist under layer film and patterning process | Shiori Nonaka, Seiichiro Tachibana, Daisuke KORI, Toshihiko Fujii | 2016-01-05 |
| 9207535 | Method for producing resist composition | Yusuke Biyajima, Motoaki Iwabuchi | 2015-12-08 |
| 9201301 | Method for producing resist composition | Yusuke Biyajima, Motoaki Iwabuchi, Taku Morisawa | 2015-12-01 |
| 9201304 | Pattern forming process | Jun Hatakeyama | 2015-12-01 |
| 9188866 | Composition for forming titanium-containing resist underlayer film and patterning process | Seiichiro Tachibana, Takafumi Ueda, Yoshinori Taneda | 2015-11-17 |
| 9176382 | Composition for forming titanium-containing resist underlayer film and patterning process | Seiichiro Tachibana, Takafumi Ueda, Yoshinori Taneda | 2015-11-03 |
| 9146468 | Resist underlayer film composition and patterning process using the same | Jun Hatakeyama, Daisuke KORI | 2015-09-29 |
| 9136122 | Underlayer film-forming composition and pattern forming process | Jun Hatakeyama, Daisuke KORI | 2015-09-15 |
| 9136121 | Underlayer film-forming composition and pattern forming process | Jun Hatakeyama, Daisuke KORI | 2015-09-15 |
| 9122147 | Pattern forming process | Jun Hatakeyama | 2015-09-01 |
| 9091925 | Method for forming silicon-containing resist underlayer film | Takao Yoshihara, Motoaki Iwabuchi | 2015-07-28 |
| 9075309 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | Takafumi Ueda, Yoshinori Taneda | 2015-07-07 |
| 9076738 | Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative | Takeru Watanabe, Toshihiko Fujii, Takeshi Kinsho | 2015-07-07 |
| 9069247 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | Takafumi Ueda, Yoshinori Taneda | 2015-06-30 |
| 9052603 | Pattern forming process | Jun Hatakeyama, Yusuke Biyajima | 2015-06-09 |
| 9045587 | Naphthalene derivative, resist bottom layer material, and patterning process | Takeshi Kinsho, Daisuke KORI, Katsuya Takemura, Takeru Watanabe | 2015-06-02 |
| 9046764 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | Seiichiro Tachibana, Daisuke KORI, Kazumi Noda, Takeshi Kinsho | 2015-06-02 |
| 9005883 | Patterning process | Takafumi Ueda | 2015-04-14 |
| 8999625 | Silicon-containing antireflective coatings including non-polymeric silsesquioxanes | Martin Glodde, Wu-Song Huang, Javier Perez, Ratnam Sooriyakumaran, Takeshi Kinsho +2 more | 2015-04-07 |
| 8992790 | Patterning process | Jun Hatakeyama | 2015-03-31 |
| 8951711 | Patterning process and composition for forming silicon-containing film usable therefor | Takafumi Ueda, Toshiharu Yano | 2015-02-10 |
| 8951917 | Composition for forming resist underlayer film and patterning process using the same | Takafumi Ueda, Toshiharu Yano, Fujio Yagihashi | 2015-02-10 |
| 8945820 | Silicon-containing resist underlayer film-forming composition and patterning process | Takafumi Ueda, Yoshinori Taneda | 2015-02-03 |