Issued Patents All Time
Showing 126–150 of 191 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8288072 | Resist lower layer film-formed substrate | Jun Hatakeyama, Kazumi Noda, Seiichiro Tachibana, Takeshi Kinsho | 2012-10-16 |
| 8198016 | Patterning process | Jun Hatakeyama, Mutsuo Nakashima, Kazuhiro Katayama | 2012-06-12 |
| 8029974 | Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process | Takafumi Ueda, Toshiharu Yano | 2011-10-04 |
| 8026038 | Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method | Takafumi Ueda, Toshiharu Yano, Mutsuo Nakashima | 2011-09-27 |
| 7910283 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda | 2011-03-22 |
| 7875417 | Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Toshiharu Yano, Koji Hasegawa | 2011-01-25 |
| 7868407 | Substrate comprising a lower silicone resin film and an upper silicone resin film | Takafumi Ueda | 2011-01-11 |
| 7855043 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Takafumi Ueda, Takeshi Asano, Motoaki Iwabuchi | 2010-12-21 |
| 7687228 | Antireflection film composition and patterning process using the same | Jun Hatakeyama, Kazumi Noda, Seiichiro Tachibana, Takeshi Kinsho | 2010-03-30 |
| 7678529 | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | Takeshi Asano, Motoaki Iwabuchi, Takafumi Ueda | 2010-03-16 |
| 7642043 | Rework process for photoresist film | Takafumi Ueda | 2010-01-05 |
| 7638268 | Rework process for photoresist film | Takafumi Ueda | 2009-12-29 |
| 7585613 | Antireflection film composition, substrate, and patterning process | Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda | 2009-09-08 |
| 7541134 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | Motoaki Iwabuchi, Yoshitaka Hamada, Takeshi Asano, Takafumi Ueda, Dirk Pfeiffer | 2009-06-02 |
| 7485690 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Yoshitaka Hamada, Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda, Dirk Pfeiffer | 2009-02-03 |
| 7417104 | Porous film-forming composition, patterning process, and porous sacrificial film | Motoaki Iwabuchi, Yoshitaka Hamada, Takeshi Asano, Takafumi Ueda | 2008-08-26 |
| 7405459 | Semiconductor device comprising porous film | Fujio Yagihashi, Hideo Nakagawa, Masaru Sasago | 2008-07-29 |
| 7402621 | Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device | Fujio Yagihashi, Yoshitaka Hamada, Takeshi Anaso, Motoaki Iwabuchi, Masaru Sasago +1 more | 2008-07-22 |
| 7385021 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Yoshitaka Hamada, Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda | 2008-06-10 |
| 7332446 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | Fujio Yagihashi, Yoshitaka Hamada, Takeshi Asano, Motoaki Iwabuchi, Hideo Nakagawa +1 more | 2008-02-19 |
| 7309722 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Fujio Yagihashi, Hideo Nakagawa, Masaru Sasago | 2007-12-18 |
| 7303785 | Antireflective film material, and antireflective film and pattern formation method using the same | Takeshi Asano, Motoaki Iwabuchi, Fujio Yagihashi | 2007-12-04 |
| 7244657 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Fujio Yagihashi, Hideo Nakagawa, Masaru Sasago | 2007-07-17 |
| 7205338 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Fujio Yagihashi, Hideo Nakagawa, Masaru Sasago | 2007-04-17 |
| 7202013 | Antireflective film material, and antireflective film and pattern formation method using the same | Takeshi Asano, Motoaki Iwabuchi, Fujio Yagihashi | 2007-04-10 |