Issued Patents All Time
Showing 101–125 of 191 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8932953 | Composition for forming a silicon-containing resist underlayer film and patterning process using the same | Takafumi Ueda, Toshiharu Yano, Yoshinori Taneda | 2015-01-13 |
| 8927192 | Production method of resist composition for lithography | Motoaki Iwabuchi | 2015-01-06 |
| 8877422 | Resist underlayer film composition and patterning process using the same | Daisuke KORI, Yusuke Biyajima, Toshihiko Fujii, Takeru Watanabe, Takeshi Kinsho | 2014-11-04 |
| 8859189 | Patterning process | Takafumi Ueda, Toshiharu Yano | 2014-10-14 |
| 8853031 | Resist underlayer film composition and patterning process using the same | Daisuke KORI, Yusuke Biyajima, Takeru Watanabe, Toshihiko Fujii, Takeshi Kinsho | 2014-10-07 |
| 8852844 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | Takafumi Ueda, Toshiharu Yano | 2014-10-07 |
| 8846846 | Naphthalene derivative, resist bottom layer material, and patterning process | Takeshi Kinsho, Daisuke KORI, Katsuya Takemura, Takeru Watanabe | 2014-09-30 |
| 8835092 | Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative | Takeru Watanabe, Takeshi Kinsho, Katsuya Takemura, Toshihiko Fujii, Daisuke KORI | 2014-09-16 |
| 8835102 | Patterning process and composition for forming silicon-containing film usable therefor | Takafumi Ueda, Toshiharu Yano | 2014-09-16 |
| 8835697 | Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process | Daisuke KORI, Takeshi Kinsho, Katsuya Takemura, Takeru Watanabe, Hiroyuki Urano | 2014-09-16 |
| 8822128 | Production method of resist composition for lithography | Motoaki Iwabuchi | 2014-09-02 |
| 8795955 | Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process | Takeshi Kinsho, Katsuya Takemura, Daisuke KORI, Takeru Watanabe | 2014-08-05 |
| 8759220 | Patterning process | Takafumi Ueda, Seiichiro Tachibana, Yoshinori Taneda, Martin Glodde, Margaret C. Lawson +1 more | 2014-06-24 |
| 8715913 | Silicon-containing resist underlayer film-forming composition and patterning process | Takafumi Ueda, Fujio Yagihashi | 2014-05-06 |
| 8697330 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | Toshiharu Yano, Takafumi Ueda | 2014-04-15 |
| 8663898 | Resist underlayer film composition and patterning process using the same | Takeru Watanabe, Yusuke Biyajima, Daisuke KORI, Takeshi Kinsho, Toshihiko Fujii | 2014-03-04 |
| 8652267 | Coated-type silicon-containing film stripping process | Takafumi Ueda, Toshiharu Yano, Shozo Shirai | 2014-02-18 |
| 8652757 | Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film | Jun Hatakeyama, Toshihiko Fujii | 2014-02-18 |
| 8652750 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Toshiharu Yano, Koji Hasegawa | 2014-02-18 |
| 8603732 | Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process | Takeru Watanabe, Takeshi Kinsho, Katsuya Takemura, Toshihiko Fujii, Daisuke KORI | 2013-12-10 |
| 8592956 | Resist underlayer film composition and patterning process using the same | Daisuke KORI, Yusuke Biyajima, Takeru Watanabe, Toshihiko Fujii, Takeshi Kinsho | 2013-11-26 |
| 8501386 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | Takafumi Ueda, Toshiharu Yano, Koji Hasegawa | 2013-08-06 |
| 8450048 | Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film | Jun Hatakeyama, Toshihiko Fujii | 2013-05-28 |
| 8343711 | Patterning process | Takafumi Ueda, Toshiharu Yano | 2013-01-01 |
| 8329376 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Takafumi Ueda, Motoaki Iwabuchi | 2012-12-11 |