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2023-01-24 |
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Personnel-tolerant carbon dioxide beamline variation reduction |
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2022-08-02 |
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Lithography process delay characterization and effective dose compensation |
Luciana Meli, Ekmini Anuja De Silva, Cody J. Murray |
2021-12-07 |
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Lithographic dose characterization |
Daniel A. Corliss |
2021-02-16 |
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Baseline overlay control with residual noise reduction |
Daniel A. Corliss, Scott D. Halle, Richard C. Johnson, Chumeng Zheng |
2020-05-05 |
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Determination of lithography effective dose uniformity |
Daniel A. Corliss, Luciana Meli Thompson |
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Determination of lithography effective dose uniformity |
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Microelectronic substrate having removable edge extension element |
Charles W. Koburger, III, Steven J. Holmes, David V. Horak, Kurt R. Kimmel, Karen E. Petrillo |
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Microelectronic substrate having removable edge extension element |
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Lithography tool image quality evaluating and correcting |
William A. Enichen |
2008-06-24 |
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Lithography tool test patterns and method |
— |
2006-06-06 |
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Lithography tool image quality evaluating and correcting |
William A. Enichen |
2005-08-16 |
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Rodney A. Kendall |
2003-10-28 |
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Michael S. Gordon, Jon E. Lieberman |
2003-06-03 |
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Werner Stickel |
2003-04-01 |
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2002-11-05 |
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Scott A. Messick, Wayne M. Moreau |
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E-beam shape aperature incorporating lithographically defined heater element |
— |
2001-12-04 |
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Charged particle beam performance measurement system and method thereof |
Werner Stickel |
1999-08-10 |
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Proximity correction dose modulation for E-beam projection lithography |
— |
1999-02-02 |
| 5763894 |
Calibration patterns and techniques for charged particle projection lithography systems |
William A. Enichen |
1998-06-09 |
| 5751004 |
Projection reticle transmission control for coulomb interaction analysis |
Werner Stickel |
1998-05-12 |
| 5712488 |
Electron beam performance measurement system and method thereof |
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1998-01-27 |
