Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9715995 | Apparatus and methods for electron beam lithography using array cathode | Keith Standiford, Alan D. Brodie | 2017-07-25 |
| 9355818 | Reflection electron beam projection lithography using an ExB separator | — | 2016-05-31 |
| 8957394 | Compact high-voltage electron gun | Alan D. Brodie, Joseph Maurino, Mark A. McCord | 2015-02-17 |
| 8642981 | Electron microscope assembly for viewing the wafer plane image of an electron beam lithography tool | Mark A. McCord, Michael D. Madsen, Alan D. Brodie | 2014-02-04 |
| 8373144 | Quasi-annular reflective electron patterning device | Mark A. McCord, Allen M. Carroll | 2013-02-12 |
| 8253119 | Well-based dynamic pattern generator | Alan D. Brodie, Mark A. McCord | 2012-08-28 |
| 7714287 | Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope | Edward James, Ye Yang, Mark Lin, Alexander Jozef Gubbens | 2010-05-11 |
| 6828571 | Apparatus and methods of controlling surface charge and focus | Mark A. McCord, Jan Lauber, Ross W. Thompson, Jason Lim, Frank Fan +1 more | 2004-12-07 |
| 6262425 | Curvilinear axis set-up for charged particle lithography | Michael S. Gordon, Christopher F. Robinson, James D. Rockrohr | 2001-07-17 |
| 6069684 | Electron beam projection lithography system (EBPS) | Steven D. Golladay, Hans C. Pfeiffer, Werner Stickel | 2000-05-30 |
| 5793048 | Curvilinear variable axis lens correction with shifted dipoles | Guenther O. Langner | 1998-08-11 |
| 5747814 | Method for centering a lens in a charged-particle system | Michael S. Gordon | 1998-05-05 |
| 5650628 | Simultaneous deflections in charged-particle beams | Michael S. Gordon, Donald F. Haire, James D. Rockrohr | 1997-07-22 |
| 5635719 | Variable curvilinear axis deflection means for particle optical lenses | — | 1997-06-03 |
| 5585629 | Electron beam nano-metrology system | Samuel K. Doran, William A. Enichen, Timothy R. Groves, Rodney A. Kendall, Henri A. Khoury +2 more | 1996-12-17 |
| 5530251 | Inductively coupled dual-stage magnetic deflection yoke | — | 1996-06-25 |
| 5530252 | Inductively coupled dual-stage magnetic deflection yoke | — | 1996-06-25 |
| 5481164 | Variable axis stigmator | Guenther O. Langner | 1996-01-02 |
| 5389858 | Variable axis stigmator | Guenther O. Langner | 1995-02-14 |
| 5136167 | Electron beam lens and deflection system for plural-level telecentric deflection | Guenther O. Langner | 1992-08-04 |
| 4607167 | Charged particle beam lithography machine incorporating localized vacuum envelope | — | 1986-08-19 |
| 4584479 | Envelope apparatus for localized vacuum processing | John R. Lamattina | 1986-04-22 |
| 4560880 | Apparatus for positioning a workpiece in a localized vacuum processing system | Michael S. Foley, John J. Waz, Robert W. Milgate, III | 1985-12-24 |
| 4528451 | Gap control system for localized vacuum processing | Michael S. Foley, Mark W. Utlaut, Joseph A. Laiacano | 1985-07-09 |
| 4524261 | Localized vacuum processing apparatus | Michael S. Foley | 1985-06-18 |