| 7053388 |
Dual-mode electron beam lithography machine |
Nigel Crosland, Klaus-Dieter Adam, Jeffrey Kristoff, Brian Rafferty, Gerhard Schubert |
2006-05-30 |
| 6822248 |
Spatial phase locking with shaped electron beam lithography |
Juan Ferrera, James G. Goodberlet, John G. Hartley, Mark K. Mondol, Mark Schattenburg +1 more |
2004-11-23 |
| 6369396 |
Calibration target for electron beams |
John G. Hartley, Rodney A. Kendall, Maris A. Sturans |
2002-04-09 |
| 6296976 |
Compensation of within-subfield linewidth variation in e-beam projection lithography |
Steven D. Golladay, Hans C. Pfeiffer |
2001-10-02 |
| 6175122 |
Method for writing a pattern using multiple variable shaped electron beams |
Rodney A. Kendall |
2001-01-16 |
| 5981962 |
Distributed direct write lithography system using multiple variable shaped electron beams |
Rodney A. Kendall |
1999-11-09 |
| 5962859 |
Multiple variable shaped electron beam system with lithographic structure |
Rodney A. Kendall |
1999-10-05 |
| 5916716 |
Emulation methodology for critical dimension control in E-Beam lithography |
Rainer Butsch, John G. Hartley |
1999-06-29 |
| 5756234 |
High accuracy fabrication of X-ray masks with optical and E-beam lithography |
Juan R. Maldonado |
1998-05-26 |
| 5585629 |
Electron beam nano-metrology system |
Samuel K. Doran, William A. Enichen, Rodney A. Kendall, Henri A. Khoury, Richard D. Moore +2 more |
1996-12-17 |
| 4859856 |
Telecentric sub-field deflection with vail |
Hans C. Pfeiffer, Werner Stickel, Maris A. Sturans |
1989-08-22 |
| 4737644 |
Conductive coated semiconductor electrostatic deflection plates |
Douglas G. Cullum, George J. Giuffre, Werner Stickel, Maris A. Sturans |
1988-04-12 |
| 4455561 |
Electron beam driven ink jet printer |
James H. Boyden, Donald R. Bradbury, Garrett A. Garrettson, Lawrence R. Hanlon, Armand P. Neukermans |
1984-06-19 |
