| 6710361 |
Multi-beam hybrid solenoid lens electron beam system |
Michael S. Gordon, Maris A. Sturans |
2004-03-23 |
| 6633040 |
Solenoid electron beam lenses with high demagnification and low aberrations |
Maris A. Sturans |
2003-10-14 |
| 6296976 |
Compensation of within-subfield linewidth variation in e-beam projection lithography |
Timothy R. Groves, Steven D. Golladay |
2001-10-02 |
| 6180947 |
Multi-element deflection aberration correction for electron beam lithography |
Werner Stickel, Michael S. Gordon, Steven D. Golladay |
2001-01-30 |
| 6130432 |
Particle beam system with dynamic focusing |
Joseph J. Senesi, Maris A. Sturans |
2000-10-10 |
| 6069684 |
Electron beam projection lithography system (EBPS) |
Steven D. Golladay, Paul F. Petric, Werner Stickel |
2000-05-30 |
| 5935739 |
Manufacturing method for membrane lithography mask with mask fields |
Thomas Bayer, Johann Greschner, Samuel Kalt, Klaus Meissner |
1999-08-10 |
| 5674413 |
Scattering reticle for electron beam systems |
Werner Stickel |
1997-10-07 |
| 5633507 |
Electron beam lithography system with low brightness |
Werner Stickel |
1997-05-27 |
| 5545902 |
Electron beam lithography system |
Werner Stickel |
1996-08-13 |
| 5466904 |
Electron beam lithography system |
Werner Stickel |
1995-11-14 |
| 4945246 |
Tri-deflection electron beam system |
Donald E. Davis, Cecil T. Ho, Jon E. Lieberman, Maris A. Sturans |
1990-07-31 |
| 4859856 |
Telecentric sub-field deflection with vail |
Timothy R. Groves, Werner Stickel, Maris A. Sturans |
1989-08-22 |
| 4843330 |
Electron beam contactless testing system with grid bias switching |
Steven D. Golladay, Fritz J. Hohn |
1989-06-27 |
| 4818885 |
Electron beam writing method and system using large range deflection in combination with a continuously moving table |
Donald E. Davis, Samuel K. Doran, Merlyn H. Perkins |
1989-04-04 |
| 4544846 |
Variable axis immersion lens electron beam projection system |
Gunther O. Langner, Maris A. Sturans |
1985-10-01 |
| 4423305 |
Method and apparatus for controlling alignment of an electron beam of a variable shape |
— |
1983-12-27 |
| 4417203 |
System for contactless electrical property testing of multi-layer ceramics |
Robert A. Simpson, Werner Stickel |
1983-11-22 |
| 4415851 |
System for contactless testing of multi-layer ceramics |
Guenther O. Langner |
1983-11-15 |
| 4376249 |
Variable axis electron beam projection system |
Guenther O. Langner, Maris A. Sturans |
1983-03-08 |
| 4251728 |
Compensated magnetic deflection coil for electron beam lithography system |
Maris A. Sturans |
1981-02-17 |
| 4243866 |
Method and apparatus for forming a variable size electron beam |
Philip M. Ryan, Edward V. Weber |
1981-01-06 |
| 4213053 |
Electron beam system with character projection capability |
— |
1980-07-15 |
