| 6617585 |
Optimized curvilinear variable axis lens doublet for charged particle beam projection system |
— |
2003-09-09 |
| 6596999 |
High performance source for electron beam projection lithography |
Steven D. Golladay, Michael S. Gordon, Rodney A. Kendall, Shinichi Kojima |
2003-07-22 |
| 6541783 |
Stencil reticle incorporating scattering features for electron beam projection lithography |
Christopher F. Robinson |
2003-04-01 |
| 6483117 |
Symmetric blanking for high stability in electron beam exposure systems |
Clay S. Clement, Michael S. Gordon, Rodney A. Kendall |
2002-11-19 |
| 6420713 |
Image position and lens field control in electron beam systems |
Steven D. Golladay |
2002-07-16 |
| 6180947 |
Multi-element deflection aberration correction for electron beam lithography |
Michael S. Gordon, Hans C. Pfeiffer, Steven D. Golladay |
2001-01-30 |
| 6069684 |
Electron beam projection lithography system (EBPS) |
Steven D. Golladay, Paul F. Petric, Hans C. Pfeiffer |
2000-05-30 |
| 6023067 |
Blanking system for electron beam projection system |
Steven D. Golladay |
2000-02-08 |
| 6005250 |
Illumination deflection system for E-beam projection |
Steven D. Golladay |
1999-12-21 |
| 5936252 |
Charged particle beam performance measurement system and method thereof |
Christopher F. Robinson |
1999-08-10 |
| 5798528 |
Correction of pattern dependent position errors in electron beam lithography |
Rainer Butsch, John G. Hartley |
1998-08-25 |
| 5751004 |
Projection reticle transmission control for coulomb interaction analysis |
Christopher F. Robinson |
1998-05-12 |
| 5712488 |
Electron beam performance measurement system and method thereof |
Christopher F. Robinson |
1998-01-27 |
| 5708274 |
Curvilinear variable axis lens correction with crossed coils |
Guenther O. Langner |
1998-01-13 |
| 5674413 |
Scattering reticle for electron beam systems |
Hans C. Pfeiffer |
1997-10-07 |
| 5633507 |
Electron beam lithography system with low brightness |
Hans C. Pfeiffer |
1997-05-27 |
| 5545902 |
Electron beam lithography system |
Hans C. Pfeiffer |
1996-08-13 |
| 5466904 |
Electron beam lithography system |
Hans C. Pfeiffer |
1995-11-14 |
| 5434424 |
Spinning reticle scanning projection lithography exposure system and method |
Rodney A. Kendall |
1995-07-18 |
| 5285074 |
Dynamic compensation of non-linear electron beam landing angle in variable axis lenses |
Don F. Haire, Cecil T. Ho, Guenther O. Langner, Edward V. Weber |
1994-02-08 |
| 4859856 |
Telecentric sub-field deflection with vail |
Timothy R. Groves, Hans C. Pfeiffer, Maris A. Sturans |
1989-08-22 |
| 4737644 |
Conductive coated semiconductor electrostatic deflection plates |
Douglas G. Cullum, George J. Giuffre, Timothy R. Groves, Maris A. Sturans |
1988-04-12 |
| 4417203 |
System for contactless electrical property testing of multi-layer ceramics |
Hans C. Pfeiffer, Robert A. Simpson |
1983-11-22 |
