Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6908255 | Remote clamping mechanism via vacuum feedthrough | Lonn E. Moore, David J. Pinckney, Richard Rieland | 2005-06-21 |
| 6818906 | Electron beam position reference system | John G. Hartley, David J. Pinckney, Richard Rieland | 2004-11-16 |
| 6724001 | Electron beam lithography apparatus with self actuated vacuum bypass valve | David J. Pinckney | 2004-04-20 |
| 6639219 | Electron scatter in a thin membrane to eliminate detector saturation | Christopher F. Robinson | 2003-10-28 |
| 6596999 | High performance source for electron beam projection lithography | Steven D. Golladay, Michael S. Gordon, Shinichi Kojima, Werner Stickel | 2003-07-22 |
| 6588090 | Fabrication method of high precision, thermally stable electromagnetic coil vanes | David A. Pickney | 2003-07-08 |
| 6483117 | Symmetric blanking for high stability in electron beam exposure systems | Clay S. Clement, Michael S. Gordon, Werner Stickel | 2002-11-19 |
| 6437347 | Target locking system for electron beam lithography | John G. Hartley | 2002-08-20 |
| 6414313 | Multiple numerical aperture electron beam projection lithography system | Michael S. Gordon, David J. Pinckney | 2002-07-02 |
| 6369396 | Calibration target for electron beams | John G. Hartley, Timothy R. Groves, Maris A. Sturans | 2002-04-09 |
| 6353231 | Pinhole detector for electron intensity distribution | Steven D. Golladay, Michael S. Gordon, Carl E. Bohnenkamp | 2002-03-05 |
| 6252339 | Removable bombardment filament-module for electron beam projection systems | — | 2001-06-26 |
| 6246053 | Non-contact autofocus height detector for lithography systems | Gary J. Johnson, David J. Pinckney | 2001-06-12 |
| 6175122 | Method for writing a pattern using multiple variable shaped electron beams | Timothy R. Groves | 2001-01-16 |
| 6153885 | Toroidal charged particle deflector with high mechanical stability and accuracy | — | 2000-11-28 |
| 6091187 | High emittance electron source having high illumination uniformity | Steven D. Golladay, Carl E. Bohnenkamp | 2000-07-18 |
| 6053241 | Cooling method and apparatus for charged particle lenses and deflectors | — | 2000-04-25 |
| 6028662 | Adjustment of particle beam landing angle | Maris A. Sturans | 2000-02-22 |
| 5981962 | Distributed direct write lithography system using multiple variable shaped electron beams | Timothy R. Groves | 1999-11-09 |
| 5962859 | Multiple variable shaped electron beam system with lithographic structure | Timothy R. Groves | 1999-10-05 |
| 5742065 | Heater for membrane mask in an electron-beam lithography system | Michael S. Gordon, David J. Pinckney, James L. Speidell | 1998-04-21 |
| 5585629 | Electron beam nano-metrology system | Samuel K. Doran, William A. Enichen, Timothy R. Groves, Henri A. Khoury, Richard D. Moore +2 more | 1996-12-17 |
| 5532903 | Membrane electrostatic chuck | — | 1996-07-02 |
| 5508518 | Lithography tool with vibration isolation | — | 1996-04-16 |
| 5434424 | Spinning reticle scanning projection lithography exposure system and method | Werner Stickel | 1995-07-18 |