| 7863563 |
Carbon tube for electron beam application |
Lonn E. Moore, Rajinder S. Dhaliwal |
2011-01-04 |
| 6806943 |
Mask clamping device |
Wayne A. Barringer, David J. Pinckney, Joseph Santilli |
2004-10-19 |
| 6710361 |
Multi-beam hybrid solenoid lens electron beam system |
Hans C. Pfeiffer, Michael S. Gordon |
2004-03-23 |
| 6633040 |
Solenoid electron beam lenses with high demagnification and low aberrations |
Hans C. Pfeiffer |
2003-10-14 |
| 6586746 |
Multipole electrostatic e-beam deflector |
Scott A. Messick, Joseph J. Senesi |
2003-07-01 |
| 6486953 |
Accurate real-time landing angle and telecentricity measurement in lithographic systems |
Michael S. Gordon, John G. Hartley, James D. Rockrohr |
2002-11-26 |
| 6429607 |
Constant power dynamic focus coil |
Michael S. Gordon |
2002-08-06 |
| 6369396 |
Calibration target for electron beams |
John G. Hartley, Timothy R. Groves, Rodney A. Kendall |
2002-04-09 |
| 6130432 |
Particle beam system with dynamic focusing |
Hans C. Pfeiffer, Joseph J. Senesi |
2000-10-10 |
| 6028662 |
Adjustment of particle beam landing angle |
Rodney A. Kendall |
2000-02-22 |
| 5570405 |
Registration and alignment technique for X-ray mask fabrication |
Ken Chan, William A. Enichen, John G. Hartley |
1996-10-29 |
| 5169488 |
Method of forming planarized, reusable calibration grids |
George J. Giuffre, James F. White, Robert R. Wilbarg |
1992-12-08 |
| 5043586 |
Planarized, reusable calibration grids |
George J. Giuffre, James F. White, Robert R. Wilbarg |
1991-08-27 |
| 4945246 |
Tri-deflection electron beam system |
Donald E. Davis, Cecil T. Ho, Jon E. Lieberman, Hans C. Pfeiffer |
1990-07-31 |
| 4859856 |
Telecentric sub-field deflection with vail |
Timothy R. Groves, Hans C. Pfeiffer, Werner Stickel |
1989-08-22 |
| 4737644 |
Conductive coated semiconductor electrostatic deflection plates |
Douglas G. Cullum, George J. Giuffre, Timothy R. Groves, Werner Stickel |
1988-04-12 |
| 4544846 |
Variable axis immersion lens electron beam projection system |
Gunther O. Langner, Hans C. Pfeiffer |
1985-10-01 |
| 4376249 |
Variable axis electron beam projection system |
Hans C. Pfeiffer, Guenther O. Langner |
1983-03-08 |
| 4251728 |
Compensated magnetic deflection coil for electron beam lithography system |
Hans C. Pfeiffer |
1981-02-17 |
