Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11621144 | Electron optical system and multi-beam image acquiring apparatus | — | 2023-04-04 |
| 11615938 | High-resolution multiple beam source | Victor Katsap | 2023-03-28 |
| 11145485 | Multiple electron beams irradiation apparatus | Kazuhiko Inoue, Atsushi Ando, Munehiro Ogasawara | 2021-10-12 |
| 11139138 | Multiple electron beams irradiation apparatus | Kazuhiko Inoue, Atsushi Ando, Munehiro Ogasawara | 2021-10-05 |
| 10937623 | Deflector for multiple electron beams and multiple beam image acquiring apparatus | — | 2021-03-02 |
| 10734190 | Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation method | Atsushi Ando, Munehiro Ogasawara, Riki Ogawa | 2020-08-04 |
| 9177817 | Methods for fabricating three-dimensional nano-scale structures and devices | Ravi K. Bonam | 2015-11-03 |
| 8729492 | Methods, devices, and systems for manipulating charged particle streams | Junru RUAN, Gregory Denbeaux | 2014-05-20 |
| 6822248 | Spatial phase locking with shaped electron beam lithography | Juan Ferrera, James G. Goodberlet, Timothy R. Groves, Mark K. Mondol, Mark Schattenburg +1 more | 2004-11-23 |
| 6818906 | Electron beam position reference system | Rodney A. Kendall, David J. Pinckney, Richard Rieland | 2004-11-16 |
| 6614035 | Multi-beam shaped beam lithography system | — | 2003-09-02 |
| 6486953 | Accurate real-time landing angle and telecentricity measurement in lithographic systems | Michael S. Gordon, James D. Rockrohr, Maris A. Sturans | 2002-11-26 |
| 6437347 | Target locking system for electron beam lithography | Rodney A. Kendall | 2002-08-20 |
| 6369396 | Calibration target for electron beams | Timothy R. Groves, Rodney A. Kendall, Maris A. Sturans | 2002-04-09 |
| 6291819 | Method of calibrating an electron beam system for lithography | — | 2001-09-18 |
| 6177680 | Correction of pattern-dependent errors in a particle beam lithography system | Gregory J. Dick, Abigail S. Ganong, John W. Pavick, Denise M. Puisto | 2001-01-23 |
| 6090528 | Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge | Michael S. Gordon | 2000-07-18 |
| 6091072 | Piece-wise processing of very large semiconductor designs | Gregory J. Dick, Joseph B. Frei, Abigail S. Ganong, John W. Pavick | 2000-07-18 |
| 5917932 | System and method for evaluating image placement on pre-distorted masks | — | 1999-06-29 |
| 5916716 | Emulation methodology for critical dimension control in E-Beam lithography | Rainer Butsch, Timothy R. Groves | 1999-06-29 |
| 5838013 | Method for monitoring resist charging in a charged particle system | Rainer Butsch, William A. Enichen, Michael S. Gordon | 1998-11-17 |
| 5825039 | Digitally stepped deflection raster system and method of use thereof | — | 1998-10-20 |
| 5798528 | Correction of pattern dependent position errors in electron beam lithography | Rainer Butsch, Werner Stickel | 1998-08-25 |
| 5773836 | Method for correcting placement errors in a lithography system | — | 1998-06-30 |
| 5621216 | Hardware/software implementation for multipass E-beam mask writing | Eileen Veronica Clarke, William A. Enichen | 1997-04-15 |