Issued Patents All Time
Showing 26–32 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6221568 | Developers for polychloroacrylate and polychloromethacrylate based resists | Marie Angelopoulos, Wayne M. Moreau | 2001-04-24 |
| 6043003 | E-beam application to mask making using new improved KRS resist system | James J. Bucchignano, Wu-Song Huang, Ahmad D. Katnani, Kim Y. Lee, Wayne M. Moreau | 2000-03-28 |
| 6037097 | E-beam application to mask making using new improved KRS resist system | James J. Bucchignano, Wu-Song Huang, Ahmad D. Katnani, Kim Y. Lee, Wayne M. Moreau | 2000-03-14 |
| 5908732 | Polymer compositions for high resolution resist applications | Ari Aviram, Andrew T. S. Pomerene, David E. Seeger | 1999-06-01 |
| 5770345 | Photoresist having increased sensitivity and use thereof | Edward D. Babich, John P. Simons, David E. Seeger | 1998-06-23 |
| 5753412 | Photoresist having increased sensitivity and use thereof | Edward D. Babich, John P. Simons, David E. Seeger | 1998-05-19 |
| 5593812 | Photoresist having increased sensitivity and use thereof | Edward D. Babich, John P. Simons, David E. Seeger | 1997-01-14 |