| 9624710 |
Door operating system |
Dustin Bowman, Kevin Landgraff, Christopher D. Adams |
2017-04-18 |
| 9170273 |
High frequency capacitance-voltage nanoprobing characterization |
Terence L. Kane, Matthew F. Stanton |
2015-10-27 |
| 9052338 |
Inert gas delivery system for electrical inspection apparatus |
Terence L. Kane, Richard W. Oldrey |
2015-06-09 |
| 8701511 |
Inert gas delivery system for electrical inspection apparatus |
Richard W. Oldrey, Terence L. Kane |
2014-04-22 |
| 8367483 |
Antifuse structure for in line circuit modification |
Terence L. Kane, Yun-Yu Wang, Keith Kwong Hon Wong |
2013-02-05 |
| 8367484 |
Antifuse structure for in line circuit modification |
Terence L. Kane, Yun-Yu Wang, Keith Kwong Hon Wong |
2013-02-05 |
| 8368069 |
Antifuse structure for in line circuit modification |
Terence L. Kane, Yun-Yu Wang, Keith Kwong Hon Wong |
2013-02-05 |
| 8368070 |
Antifuse structure for in line circuit modification |
Terence L. Kane, Yun-Yu Wang, Keith Kwong Hon Wong |
2013-02-05 |
| 8125048 |
Antifuse structure for in line circuit modification |
Terence L. Kane, Yun-Yu Wang, Keith Kwong Hon Wong |
2012-02-28 |
| 7993504 |
Backside unlayering of MOSFET devices for electrical and physical characterization |
Terence L. Kane, Darrell L. Miles, John D. Sylvestri |
2011-08-09 |
| 7881093 |
Programmable precision resistor and method of programming the same |
Anthony G. Domenicucci, Terence L. Kane, Yun-Yu Wang |
2011-02-01 |
| 7371689 |
Backside unlayering of MOSFET devices for electrical and physical characterization |
Terence L. Kane, Darrell L. Miles, John D. Sylvestri |
2008-05-13 |
| 7205237 |
Apparatus and method for selected site backside unlayering of si, GaAs, GaxAlyAszof SOI technologies for scanning probe microscopy and atomic force probing characterization |
Andrew Deering, Terence L. Kane, Philip V. Kaszuba, Leon Moszkowicz, Carmelo F. Scrudato |
2007-04-17 |
| 7015146 |
Method of processing backside unlayering of MOSFET devices for electrical and physical characterization including a collimated ion plasma |
Terence L. Kane, Darrell L. Miles, John D. Sylyestri |
2006-03-21 |
| 6888224 |
Methods and systems for fabricating electrical connections to semiconductor structures incorporating low-k dielectric materials |
Terence L. Kane |
2005-05-03 |
| 6884641 |
Site-specific methodology for localization and analyzing junction defects in mosfet devices |
John Bruley, Terence L. Kane, Yun-Yu Wang |
2005-04-26 |
| 6858530 |
Method for electrically characterizing charge sensitive semiconductor devices |
Terence L. Kane, Lawrence Fischer, Steven B. Herschbein, Ying Hong |
2005-02-22 |
| 6703641 |
Structure for detecting charging effects in device processing |
Terence L. Kane, Yun-Yu Wang, Malcolm P. Cambra, Jr. |
2004-03-09 |
| 6670717 |
Structure and method for charge sensitive electrical devices |
Terence L. Kane, Lawrence Fischer, Steven B. Herschbein, Ying Hong |
2003-12-30 |
| 6630395 |
Methods for fabricating electrical connections to semiconductor structures incorporating low-k dielectric materials |
Terence L. Kane |
2003-10-07 |
