Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8111903 | Inline low-damage automated failure analysis | Ronald C. Geiger, Jr., George Y. Gu, Oleg Gluschenkov, Xu Ouyang | 2012-02-07 |
| 7867910 | Method of accessing semiconductor circuits from the backside using ion-beam and gas-etch | Carmelo F. Scrudato, George Y. Gu, Loren L. Hahn | 2011-01-11 |
| 7781733 | In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniques | Herschel M. Marchman, Narender Rana, Chad Rue | 2010-08-24 |
| 7351966 | High-resolution optical channel for non-destructive navigation and processing of integrated circuits | Herschel M. Marchman, Chad Rue, Michael Renner, Narender Rana | 2008-04-01 |
| 7119333 | Ion detector for ion beam applications | Narender Rana, Chad Rue, Michael Sievers | 2006-10-10 |
| 6987067 | Semiconductor copper line cutting method | Lawrence Fischer | 2006-01-17 |
| 6946064 | Sample mount for performing sputter-deposition in a focused ion beam (FIB) tool | Lawrence Fischer, Chad Rue | 2005-09-20 |
| 6900137 | Dry etch process to edit copper lines | Ville S. Kiiskinen, Chad Rue, Carmelo F. Scrudato, Michael Sievers | 2005-05-31 |
| 6858530 | Method for electrically characterizing charge sensitive semiconductor devices | Terence L. Kane, Lawrence Fischer, Ying Hong, Michael P. Tenney | 2005-02-22 |
| 6843893 | Metal dry etch using electronic field | Herschel M. Marchman, Chad Rue, Michael Sievers | 2005-01-18 |
| 6730237 | Focused ion beam process for removal of copper | Michael Sievers, Aaron Shore | 2004-05-04 |
| 6670717 | Structure and method for charge sensitive electrical devices | Terence L. Kane, Lawrence Fischer, Ying Hong, Michael P. Tenney | 2003-12-30 |