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Anthony G. Domenicucci

IBM: 38 patents #2,506 of 70,183Top 4%
Infineon Technologies Ag: 2 patents #4,439 of 7,486Top 60%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
JU Jeol Usa: 1 patents #3 of 12Top 25%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 New Paltz, NY: #11 of 139 inventorsTop 8%
🗺 New York: #2,841 of 115,490 inventorsTop 3%
Overall (All Time): #86,970 of 4,157,543Top 3%
38
Patents All Time

Issued Patents All Time

Showing 26–38 of 38 patents

Patent #TitleCo-InventorsDate
6875982 Electron microscope magnification standard providing precise calibration in the magnification range 5000X-2000,000X Stephen W. Bedell, John Bruley, Devendra K. Sadana 2005-04-05
6531411 Surface roughness improvement of SIMOX substrates by controlling orientation of angle of starting material Neena Garg, Kenneth J. Giewont, Richard J. Murphy, Gerd Pfeiffer, Gregory D. Pomarico +2 more 2003-03-11
6509265 Process for manufacturing a contact barrier Patrick W. DeHaven, Lynne M. Gignac, Glen L. Miles, Prabhat Tiwari, Yun-Yu Wang +2 more 2003-01-21
6495429 Controlling internal thermal oxidation and eliminating deep divots in SIMOX by chlorine-based annealing Michael E. Adamcek, Stephen Fox, Neena Garg, Kenneth J. Giewont, Thomas R. Kupiec +2 more 2002-12-17
6475893 Method for improved fabrication of salicide structures Kenneth J. Giewont, Yun-Yu Wang, Russell H. Arndt, Craig Ransom, Judith Coffin +2 more 2002-11-05
6417567 Flat interface for a metal-silicon contract barrier film Lynne M. Gignac, Yun-Yu Wang, Horatio S. Wildman, Kwong Hon Wong, Roy A. Carruthers +2 more 2002-07-09
6388327 Capping layer for improved silicide formation in narrow semiconductor structures Kenneth J. Giewont, Stephen Bruce Brodsky, Cyril Cabral, Jr., Craig Ransom, Yun-Yu Wang +2 more 2002-05-14
6387790 Conversion of amorphous layer produced during IMP Ti deposition Chung-Ping Eng, William J. Murphy, Tina Wagner, Yun-Yu Wang, Kwong Hon Wong 2002-05-14
6335262 Method for fabricating different gate oxide thicknesses within the same chip Scott W. Crowder, Liang Han, Michael Hargrove, Paul A. Ronsheim 2002-01-01
6180521 Process for manufacturing a contact barrier Patrick W. DeHaven, Lynne M. Gignac, Glen L. Miles, Prabhat Tiwari, Yun-Yu Wang +2 more 2001-01-30
6124639 Flat interface for a metal-silicon contact barrier film Lynne M. Gignac, Yun-Yu Wang, Horatio S. Wildman, Kwong Hon Wong 2000-09-26
6057220 Titanium polycide stabilization with a porous barrier Atul Ajmera, Christine Dehm, George G. Gifford, Stephen K. Loh, Christopher C. Parks +1 more 2000-05-02
6022801 Method for forming an atomically flat interface for a highly disordered metal-silicon barrier film Lynne M. Gignac, Yun-Yu Wang, Horatio S. Wildman, Kwong Hon Wong 2000-02-08