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Home › Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control

Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control

US Patent 5665608 · Granted Sep 9, 1997

Estimated economic value: $15,735,000 ⓘ

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