| 6291833 |
Apparatus for mapping scratches in an oxide film |
William Francis Landers |
2001-09-18 |
| 6048745 |
Method for mapping scratches in an oxide film |
William Francis Landers |
2000-04-11 |
| 5993059 |
Combined emissivity and radiance measurement for determination of temperature of radiant object |
James A. O'Neill |
1999-11-30 |
| 5953115 |
Method and apparatus for imaging surface topography of a wafer |
William Francis Landers |
1999-09-14 |
| 5770097 |
Control of etch selectivity |
James A. O'Neill |
1998-06-23 |
| 5738440 |
Combined emissivity and radiance measurement for the determination of the temperature of a radiant object |
James A. O'Neill |
1998-04-14 |
| 5683538 |
Control of etch selectivity |
James A. O'Neill |
1997-11-04 |
| 5534066 |
Fluid delivery apparatus having an infrared feedline sensor |
James A. O'Neill, Michael L. Passow, Tina J. Cotler, Jonathan D. Chapple-Sokol, Richard A. Conti |
1996-07-09 |
| 5492718 |
Fluid delivery apparatus and method having an infrared feedline sensor |
James A. O'Neill, Michael L. Passow, Tina J. Cotler, Jonathan D. Chapple-Sokol, Richard A. Conti |
1996-02-20 |
| 5387777 |
Methods and apparatus for contamination control in plasma processing |
Reid S. Bennett, Albert R. Ellingboe, George G. Gifford, Kurt L. Haller, John S. McKillop +1 more |
1995-02-07 |
| 5382911 |
Reaction chamber interelectrode gap monitoring by capacitance measurement |
Tina J. Cotler, John C. Forster, Lawrence Andrew Kropp |
1995-01-17 |
| 5367139 |
Methods and apparatus for contamination control in plasma processing |
Reid S. Bennett, Albert R. Ellingboe, George G. Gifford, Kurt L. Haller, John S. McKillop +1 more |
1994-11-22 |
| 5308414 |
Method and apparatus for optical emission end point detection in plasma etching processes |
James A. O'Neill, Michael L. Passow |
1994-05-03 |
| 4846920 |
Plasma amplified photoelectron process endpoint detection apparatus |
John H. Keller, Gary S. Selwyn |
1989-07-11 |
