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USPTO Patent Rankings Data through Dec 31, 2025
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Jyothi Singh — 14 Patents

IBM: 14 patents #8,031 of 70,183Top 15%
Hopewell Junction, NY: #135 of 648 inventorsTop 25%
New York: #10,566 of 115,490 inventorsTop 10%
Overall (All Time): #332,869 of 4,157,543Top 9%
14 Patents All Time
Jyothi Singh has been granted 14 US patents while listed as an inventor at IBM. The first was granted in 1989 and the most recent in September 2001. Jyothi Singh ranks #332,869 of 4,157,543 US inventors in our database (top 8.0%). Patent records list Jyothi Singh in Hopewell Junction, NY, US.

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
6291833 Apparatus for mapping scratches in an oxide film William Francis Landers 2001-09-18 $29,045,000
6048745 Method for mapping scratches in an oxide film William Francis Landers 2000-04-11 $38,584,000
5993059 Combined emissivity and radiance measurement for determination of temperature of radiant object James A. O'Neill 1999-11-30 $27,589,000
5953115 Method and apparatus for imaging surface topography of a wafer William Francis Landers 1999-09-14 $25,256,000
5770097 Control of etch selectivity James A. O'Neill 1998-06-23 $13,396,000
5738440 Combined emissivity and radiance measurement for the determination of the temperature of a radiant object James A. O'Neill 1998-04-14 $13,289,000
5683538 Control of etch selectivity James A. O'Neill 1997-11-04 $29,270,000
5534066 Fluid delivery apparatus having an infrared feedline sensor James A. O'Neill, Michael L. Passow, Tina J. Cotler, Jonathan D. Chapple-Sokol, Richard A. Conti 1996-07-09 $6,020,000
5492718 Fluid delivery apparatus and method having an infrared feedline sensor James A. O'Neill, Michael L. Passow, Tina J. Cotler, Jonathan D. Chapple-Sokol, Richard A. Conti 1996-02-20 $16,018,000
5387777 Methods and apparatus for contamination control in plasma processing Reid S. Bennett, Albert R. Ellingboe, George G. Gifford, Kurt L. Haller, John S. McKillop +1 more 1995-02-07 $10,783,000
5382911 Reaction chamber interelectrode gap monitoring by capacitance measurement Tina J. Cotler, John C. Forster, Lawrence Andrew Kropp 1995-01-17 $19,874,000
5367139 Methods and apparatus for contamination control in plasma processing Reid S. Bennett, Albert R. Ellingboe, George G. Gifford, Kurt L. Haller, John S. McKillop +1 more 1994-11-22 $8,506,000
5308414 Method and apparatus for optical emission end point detection in plasma etching processes James A. O'Neill, Michael L. Passow 1994-05-03 $7,556,000
4846920 Plasma amplified photoelectron process endpoint detection apparatus John H. Keller, Gary S. Selwyn 1989-07-11 $12,654,000