| 7339763 |
Disk drive thin-film inductive write head with pole tip structure having reduced susceptibility to corrosion |
Eric W. Flint, Wen-Chien David Hsiao, Michael Ming Hsiang Yang |
2008-03-04 |
| 7137190 |
Method for fabricating a magnetic transducer with a corrosion resistant layer on metallic thin films by nitrogen exposure |
Cherngye Hwang, Jila Tabib |
2006-11-21 |
| 6913704 |
Magnetic head induction coil fabrication method utilizing aspect ratio dependent etching |
Richard Hsiao |
2005-07-05 |
| 6804878 |
Method of improving the reliability of magnetic head sensors by ion milling smoothing |
Richard T. Campbell, Richard Hsiao, Son V. Nguyen, Thao Pham |
2004-10-19 |
| 6589436 |
Method of adjusting the flatness of a slider using selective plasma etching |
Jila Tabib, Richard Hsiao, Richard T. Campbell, Ciaran Fox |
2003-07-08 |
| 6515826 |
Magnetic head induction coil fabrication method utilizing aspect ratio dependent etching |
Richard Hsiao |
2003-02-04 |
| 6512382 |
Method for corrosion susceptibility testing of magnetic heads using simulated disk corrosion products |
Ciaran Fox, Atul Kumar |
2003-01-28 |
| 6503406 |
Method for forming the air bearing surface of a slider using nonreactive plasma |
Cherngye Hwang, Ciaran Fox, Richard Hsiao |
2003-01-07 |
| 6416935 |
Method for forming the air bearing surface of a slider |
Cherngye Hwang, Ciaran Fox, Richard Hsiao |
2002-07-09 |
| 6001235 |
Rotary plater with radially distributed plating solution |
David M. Arken, Andrew Chiu, Joseph J. Fatula, Jr., Robert William Hitzfield, Wen-Chien David Hsiao |
1999-12-14 |
| 5788801 |
Real time measurement of etch rate during a chemical etching process |
Steven G. Barbee, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff, Justin W. Wong |
1998-08-04 |
| 5582746 |
Real time measurement of etch rate during a chemical etching process |
Steven G. Barbee, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff, Justin W. Wong |
1996-12-10 |
| 5573624 |
Chemical etch monitor for measuring film etching uniformity during a chemical etching process |
Steven G. Barbee, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff, Justin W. Wong |
1996-11-12 |
| 5516399 |
Contactless real-time in-situ monitoring of a chemical etching |
Michael J. Balconi-Lamica, Steven G. Barbee, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff +1 more |
1996-05-14 |
| 5501766 |
Minimizing overetch during a chemical etching process |
Steven G. Barbee, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff, Justin W. Wong |
1996-03-26 |
| 5500073 |
Real time measurement of etch rate during a chemical etching process |
Steven G. Barbee, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff, Justin W. Wong |
1996-03-19 |
| 5489361 |
Measuring film etching uniformity during a chemical etching process |
Steven G. Barbee, Tony F. Heinz, Leping Li, Eugene H. Ratzlaff, Justin W. Wong |
1996-02-06 |
