Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6126848 | Indirect endpoint detection by chemical reaction and chemiluminescence | James Albert Gilhooly, Clifford Owen Morgan, III, William Joseph Surovic, Cong Wei | 2000-10-03 |
| 6072313 | In-situ monitoring and control of conductive films by detecting changes in induced eddy currents | Steven G. Barbee, Arnold Halperin, Tony F. Heinz | 2000-06-06 |
| 6066564 | Indirect endpoint detection by chemical reaction | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Chienfan Yu | 2000-05-23 |
| 6021679 | Probe for slurry gas sampling | James Albert Gilhooly, Clifford Owen Morgan, III, Cong Wei, Werner Moser, Matthias Kutter +4 more | 2000-02-08 |
| 5788801 | Real time measurement of etch rate during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Eugene H. Ratzlaff, Justin W. Wong | 1998-08-04 |
| 5770948 | Rotary signal coupling for chemical mechanical polishing endpoint detection with a strasbaugh tool | Steven G. Barbee, Arnold Halperin, Richard Ruggiero, William Joseph Surovie | 1998-06-23 |
| 5731697 | In-situ monitoring of the change in thickness of films | Steven G. Barbee, Arnold Halperin, Tony F. Heinz | 1998-03-24 |
| 5663637 | Rotary signal coupling for chemical mechanical polishing endpoint detection with a westech tool | Steven G. Barbee, Gary R. Doyle, Arnold Halperin, Kevin L. Holland, Francis Walter Kazak +4 more | 1997-09-02 |
| 5660672 | In-situ monitoring of conductive films on semiconductor wafers | Steven G. Barbee, Arnold Halperin, Tony F. Heinz | 1997-08-26 |
| 5659492 | Chemical mechanical polishing endpoint process control | Steven G. Barbee, Arnold Halperin | 1997-08-19 |
| 5644221 | Endpoint detection for chemical mechanical polishing using frequency or amplitude mode | Steven G. Barbee, Arnold Halperin | 1997-07-01 |
| 5582746 | Real time measurement of etch rate during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Eugene H. Ratzlaff, Justin W. Wong | 1996-12-10 |
| 5573624 | Chemical etch monitor for measuring film etching uniformity during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Eugene H. Ratzlaff, Justin W. Wong | 1996-11-12 |
| 5573623 | Apparatus for contactless real-time in-situ monitoring of a chemical etching process | Steven G. Barbee, Tony F. Heinz, Eugene H. Ratzlaff | 1996-11-12 |
| 5559428 | In-situ monitoring of the change in thickness of films | Steven G. Barbee, Arnold Halperin, Tony F. Heinz | 1996-09-24 |
| 5516399 | Contactless real-time in-situ monitoring of a chemical etching | Michael J. Balconi-Lamica, Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Eugene H. Ratzlaff +1 more | 1996-05-14 |
| 5501766 | Minimizing overetch during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Eugene H. Ratzlaff, Justin W. Wong | 1996-03-26 |
| 5500073 | Real time measurement of etch rate during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Eugene H. Ratzlaff, Justin W. Wong | 1996-03-19 |
| 5489361 | Measuring film etching uniformity during a chemical etching process | Steven G. Barbee, Tony F. Heinz, Yiping Hsiao, Eugene H. Ratzlaff, Justin W. Wong | 1996-02-06 |
| 5480511 | Method for contactless real-time in-situ monitoring of a chemical etching process | Steven G. Barbee, Tony F. Heinz, Eugene H. Ratzlaff | 1996-01-02 |
| 5456788 | Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process | Steven G. Barbee, Madhav Datta, Tony F. Heinz, Eugene H. Ratzlaff, Ravindra V. Shenoy | 1995-10-10 |
| 5451289 | Fixture for in-situ noncontact monitoring of wet chemical etching with passive wafer restraint | Steven G. Barbee, Tony F. Heinz, Eugene H. Ratzlaff | 1995-09-19 |
| 5445705 | Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process | Steven G. Barbee, Madhav Datta, Tony F. Heinz, Eugene H. Ratzlaff, Ravindra V. Shenoy | 1995-08-29 |
| 5392124 | Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control | Steven G. Barbee, Tony F. Heinz, Ulrich Hofer, Victor J. Silvestri | 1995-02-21 |
| 5386121 | In situ, non-destructive CVD surface monitor | Steven G. Barbee, Tony F. Heinz, Victor J. Silvestri | 1995-01-31 |