Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8634949 | Manufacturing management using tool operating data | Brian C. Barker, Edward P. Higgins, Gary R. Moore, Mark L. Reath, Justin W. Wong +1 more | 2014-01-21 |
| 6528335 | Electrical method for assessing yield-limiting asperities in silicon-on-insulator wafers | Marlene Isabel Almonte, Harold J. Hovel | 2003-03-04 |
| 6319794 | Structure and method for producing low leakage isolation devices | Hiroyuki Akatsu, Tze-Chiang Chen, Laertis Economikos, Herbert L. Ho, Jack A. Mandelman +1 more | 2001-11-20 |
| 6190955 | Fabrication of trench capacitors using disposable hard mask | Matthias Ilg, Soichi Nadahara, Ronald W. Nunes, Klaus Penner, Klaus Roithner +2 more | 2001-02-20 |
| 6140175 | Self-aligned deep trench DRAM array device | Carl Radens | 2000-10-31 |
| 6107135 | Method of making a semiconductor memory device having a buried plate electrode | Gary B. Bronner, Junichiro Iba | 2000-08-22 |
| 6074951 | Vapor phase etching of oxide masked by resist or masking material | Wesley C. Natzle, Chienfan Yu | 2000-06-13 |
| 6071815 | Method of patterning sidewalls of a trench in integrated circuit manufacturing | Wesley C. Natzle, Chienfan Yu | 2000-06-06 |
| 6057188 | Trench capacitor structures | Badih El-Kareh, Stanley E. Schuster | 2000-05-02 |
| 5970009 | Reduced stand by power consumption in a DRAM | Heinz Hoenigschmid, Jack A. Mandelman | 1999-10-19 |
| 5876879 | Oxide layer patterned by vapor phase etching | Wesley C. Natzle, Chienfan Yu | 1999-03-02 |
| 5838055 | Trench sidewall patterned by vapor phase etching | Wesley C. Natzle, Chienfan Yu | 1998-11-17 |
| 5805494 | Trench capacitor structures | Badih El-Kareh, Stanley E. Schuster | 1998-09-08 |
| 5770484 | Method of making silicon on insulator buried plate trench capacitor | — | 1998-06-23 |
| 5592412 | Enhanced deep trench storage node capacitance for DRAM | Karl Paul Muller, Klaus Roithner, Masakatsu Tuschiaki | 1997-01-07 |