Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10153181 | Substrate treating apparatus and substrate treating method | Yuta SASAKI, Yosuke HANAWA, Dai Ueda, Hiroaki Kitagawa, Katsuya Okumura | 2018-12-11 |
| 7913346 | Substrate treatment apparatus and substrate treatment method | Masaki Iwami | 2011-03-29 |
| 7776756 | Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device | Hisashi Okuchi, Hiroyasu Iimori, Mami Saito, Yoshihiro Ogawa, Hiroshi Tomita | 2010-08-17 |
| 7700381 | Semiconductor wafer with ID mark, equipment for and method of manufacturing semiconductor device from them | Tsunetoshi Arikado, Masao Iwase, Yuso Udo, Yukihiro Ushiku, Shinichi Nitta +8 more | 2010-04-20 |
| 7305275 | Material supply system in semiconductor device manufacturing plant | Kunihiro Miyazaki, Kinya Usuda, Masaji Akahori, Sota Nakagawa, Ken Nakajima | 2007-12-04 |
| 7267742 | Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device | Hisashi Okuchi, Hiroyasu Iimori, Mami Saito, Yoshihiro Ogawa, Hiroshi Tomita | 2007-09-11 |
| 7268053 | Semiconductor wafer and a method for manufacturing a semiconductor wafer | Masao Iwase | 2007-09-11 |
| 7253500 | Semiconductor wafer and a method for manufacturing a semiconductor wafer | Masao Iwase | 2007-08-07 |
| 7101259 | Polishing method and apparatus | Norio Kimura, Mitsuhiko Shirakashi, Katsuhiko Tokushige, Masao Asami, Naoto Miyashita +3 more | 2006-09-05 |
| 7055535 | Holding unit, processing apparatus and holding method of substrates | Junji Kunisawa, Norio Kimura, Kenya Ito, Akira Fukunaga, Yuuki Inoue +2 more | 2006-06-06 |
| 7057259 | Semiconductor wafer with ID mark, equipment for and method of manufacturing semiconductor device from them | Tsunetoshi Arikado, Masao Iwase, Yuso Udo, Yukihiro Ushiku, Shinichi Nitta +8 more | 2006-06-06 |
| 7015566 | Semiconductor wafer and a method for manufacturing a semiconductor wafer | Masao Iwase | 2006-03-21 |
| 6679950 | Cleaning method and cleaner | Hiroshi Tomita, Motoyuki Sato, Mitsuhiko Shirakashi, Kenya Ito | 2004-01-20 |
| 6673163 | Apparatus and method for cleaning a semiconductor substrate | Hiroshi Tomita, Motoyuki Sato | 2004-01-06 |
| 6667238 | Polishing method and apparatus | Norio Kimura, Mitsuhiko Shirakashi, Katsuhiko Tokushige, Masao Asami, Naoto Miyashita +3 more | 2003-12-23 |
| 6645876 | Etching for manufacture of semiconductor devices | Mami Saito, Hiroshi Tomita, Kunihiro Miyazaki | 2003-11-11 |
| 6639317 | Semiconductor device in trench | Hiroshi Tomita | 2003-10-28 |
| 6543080 | Apparatus and method for cleaning semiconductor substrate | Hiroshi Tomita, Mitsuhiko Shirakashi, Kenya Ito, Yuki Inoue | 2003-04-08 |
| 6492271 | Semiconductor device and method of manufacturing the same | Yoshihiro Uozumi, Hisashi Okuchi, Yoshihiro Ogawa, Hiroshi Tomita | 2002-12-10 |
| 6436723 | Etching method and etching apparatus method for manufacturing semiconductor device and semiconductor device | Hiroshi Tomita | 2002-08-20 |
| 6431185 | Apparatus and method for cleaning a semiconductor substrate | Hiroshi Tomita, Motoyuki Sato | 2002-08-13 |
| 6333274 | Method of manufacturing a semiconductor device including a seamless shallow trench isolation step | Hiroyuki Akatsu, Takashi Nakao, Seiko Yoshida | 2001-12-25 |
| 6286524 | Wafer drying apparatus and method with residual particle removability enhancement | Hisashi Okuchi, Hiroshi Tomita, Katsuya Okumura | 2001-09-11 |
| 6190955 | Fabrication of trench capacitors using disposable hard mask | Matthias Ilg, Richard L. Kleinhenz, Ronald W. Nunes, Klaus Penner, Klaus Roithner +2 more | 2001-02-20 |
| 6159303 | Liquid displacement apparatus and liquid displacement method | Katsuya Okumura | 2000-12-12 |