Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12068267 | Semiconductor device and method for manufacturing the same | — | 2024-08-20 |
| 11921428 | Substrate processing method and substrate processing apparatus | Shinsuke Kimura, Yoshihiro Ogawa, Hiroyasu Iimori, Tatsuhiko Koide, Hideaki Hirabayashi +1 more | 2024-03-05 |
| 11621239 | Semiconductor device and method for manufacturing the same | — | 2023-04-04 |
| 9929017 | Etching method using hydrogen peroxide solution containing tungsten | Nagisa Takami | 2018-03-27 |
| 9553189 | Self-aligned silicide formation on source/drain through contact via | — | 2017-01-24 |
| 9213242 | Substrate processing method and substrate processing apparatus | Shinsuke Kimura, Yoshihiro Ogawa, Hiroyasu Iimori, Tatsuhiko Koide, Hideaki Hirabayashi +1 more | 2015-12-15 |
| 9099474 | Self-aligned silicide formation on source/drain through contact via | — | 2015-08-04 |
| 8946809 | Method for manufacturing semiconductor memory device and semiconductor memory device | Kazuhide Takamura, Ryota Katsumata, Masaru Kidoh, Daigo Ichinose, Toru Matsuda | 2015-02-03 |
| 8912089 | Method for manufacturing a semiconductor device including a stacked body comprising pluralities of first and second metallic conductive layers | Seiichi Omoto, Tadashi Iguchi, Osamu Yamane, Kazuyuki Masukawa, Yoshihiro Yanai | 2014-12-16 |
| 8513140 | Post-dry etching cleaning liquid composition and process for fabricating semiconductor device | Masafumi Muramatsu, Kazumi Asada, Yukino Hagino, Atsushi Okuyama, Takahito Nakajima +4 more | 2013-08-20 |
| 8349718 | Self-aligned silicide formation on source/drain through contact via | — | 2013-01-08 |
| 8222160 | Metal containing sacrifice material and method of damascene wiring formation | — | 2012-07-17 |
| 8211800 | Ru cap metal post cleaning method and cleaning chemical | — | 2012-07-03 |
| 8168528 | Restoration method using metal for better CD controllability and Cu filing | Atsunobu Isobayashi | 2012-05-01 |
| 7884027 | Method of manufacturing semiconductor device | Takashi Hirayama, Akira Kugita | 2011-02-08 |
| 7850818 | Method of manufacturing semiconductor device and cleaning apparatus | Tsuyoshi Matsumura, Kunihiro Miyazaki | 2010-12-14 |
| 7776754 | Semiconductor device manufacturing method and chemical fluid used for manufacturing semiconductor device | Kazuhiko Takase, Tsuyoshi Matsumura | 2010-08-17 |
| 7635601 | Method of manufacturing semiconductor device and cleaning apparatus | Tsuyoshi Matsumura, Kunihiro Miyazaki | 2009-12-22 |
| 7405133 | Semiconductor device and method for manufacturing the same | Katsuaki Natori, Tomohiro Saito | 2008-07-29 |
| 7345352 | Insulating tube, semiconductor device employing the tube, and method of manufacturing the same | Tsuyoshi Matsumura, Takahito Nakajima, Hiroshi Kawamoto, Mikie Miyasato | 2008-03-18 |
| 7282437 | Insulating tube, semiconductor device employing the tube, and method of manufacturing the same | Tsuyoshi Matsumura, Takahito Nakajima, Hiroshi Kawamoto, Mikie Miyasato | 2007-10-16 |
| 7183203 | Method of plating a metal or metal compound on a semiconductor substrate that includes using the same main component in both plating and etching solutions | — | 2007-02-27 |
| 7022580 | Semiconductor device and method for manufacturing the same | Katsuaki Natori, Tomohiro Saito | 2006-04-04 |
| 6995472 | Insulating tube | Tsuyoshi Matsumura, Takahito Nakajima, Hiroshi Kawamoto, Mikie Miyasato | 2006-02-07 |
| 6818556 | Method of plating a metal or metal compound on a semiconductor substrate that includes using the same main component in both plating and etching solutions | — | 2004-11-16 |