Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12037260 | Nano metal compound particles, coating material and film using the same, method for producing film, and method of producing nano metal compound particles | Yuzo Shigesato, Junjun Jia, Daisuke FUKUSHI, Yoshinori Kataoka, Akito Sasaki +1 more | 2024-07-16 |
| 11942490 | Photon counting radiation detector and radiographic inspection device using the same | Kuniyuki Kakushima, Akito Sasaki, Atsuya SASAKI | 2024-03-26 |
| 11921428 | Substrate processing method and substrate processing apparatus | Yoshihiro Uozumi, Shinsuke Kimura, Yoshihiro Ogawa, Hiroyasu Iimori, Tatsuhiko Koide +1 more | 2024-03-05 |
| 11600866 | Semiconductor solid state battery | Atsuya SASAKI, Akito Sasaki, Yoshinori Kataoka, Shuichi Saito | 2023-03-07 |
| 11211526 | Semiconductor light-emitting element | Satoshi Kamiyama, Atsuya SASAKI, Ryosuke Hiramatsu | 2021-12-28 |
| 11211529 | Semiconductor light-emitting element and method for manufacturing same | Ryosuke Hiramatsu, Atsuya SASAKI, Satoshi Kamiyama | 2021-12-28 |
| 11129282 | Method for manufacturing ceramic circuit board | Hiromasa Kato, Fumiyuki Kawashima, Akito Sasaki | 2021-09-21 |
| 10964836 | Photon counting-type radiation detector and radiological inspection device using same | Kuniyuki Kakushima, Tomoyuki Suzuki, Kazuo Tsutsui, Akito Sasaki, Atsuya SASAKI +1 more | 2021-03-30 |
| 10242861 | Processing apparatus, processing method, and manufacturing method of electronic device | Katsuhiro Sato | 2019-03-26 |
| 10147619 | Substrate treatment apparatus, substrate treatment method, and etchant | Katsuhiro Sato, Kaori Deura, Yoshinori Kitamura, Takahiro Terada, Yoshihiro Ogawa +3 more | 2018-12-04 |
| 9536797 | Substrate treatment apparatus and substrate treatment method | Junichi Igarashi, Katsuhiro Sato, Keiko Morita | 2017-01-03 |
| 9475213 | Method for reproducing template and reproducing apparatus | Masako KOBAYASHI | 2016-10-25 |
| 9213242 | Substrate processing method and substrate processing apparatus | Yoshihiro Uozumi, Shinsuke Kimura, Yoshihiro Ogawa, Hiroyasu Iimori, Tatsuhiko Koide +1 more | 2015-12-15 |
| 7884020 | Polishing cloth and method of manufacturing semiconductor device | Naoaki Sakurai, Akiko Saito, Koji Sato, Tomiho Yamada | 2011-02-08 |
| 7291188 | Polishing cloth and method of manufacturing semiconductor device | Naoaki Sakurai, Akiko Saito, Koji Sato, Tomiho Yamada | 2007-11-06 |
| 7112125 | Polishing cloth, polishing apparatus and method of manufacturing semiconductor devices | Akiko Saito, Naoaki Sakurai, Yoshihiro Oshibe, Masahiro Ishidoya | 2006-09-26 |
| 6861010 | COPPER-BASED METAL POLISHING COMPOSITION, METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE, POLISHING COMPOSITION, ALUMINUM-BASED METAL POLISHING COMPOSITION, AND TUNGSTEN-BASED METAL POLISHING COMPOSITION | Naoaki Sakurai, Toshitsura Cho, Shumpei Shimizu, Katsuhiro Kato, Akiko Saito | 2005-03-01 |
| 6579785 | Method of making multi-level wiring in a semiconductor device | Hiroshi Toyoda, Tetsuo Matsuda, Hisashi Kaneko | 2003-06-17 |
| 6521574 | Copper-based metal polishing solution and method for manufacturing a semiconductor device | Naoaki Sakurai | 2003-02-18 |
| 6426294 | COPPER-BASED METAL POLISHING COMPOSITION, METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE, POLISHING COMPOSITION, ALUMINUM-BASED METAL POLISHING COMPOSITION, AND TUNGSTEN-BASED METAL POLISHING COMPOSITION | Naoaki Sakurai, Toshitsura Cho, Shumpei Shimizu, Katsuhiro Kato, Akiko Saito | 2002-07-30 |
| RE37786 | Copper-based metal polishing solution and method for manufacturing semiconductor device | Masatoshi Higuchi | 2002-07-09 |
| 6230738 | Flow rate control valve and flow rate control system | Yasushi Watanabe, Keiichiro Senda, Hiroshi Fujita, Naoya Hayamizu | 2001-05-15 |
| 6046110 | Copper-based metal polishing solution and method for manufacturing a semiconductor device | Naoaki Sakurai | 2000-04-04 |
| 5770095 | Polishing agent and polishing method using the same | Yasutaka Sasaki, Nobuo Hayasaka, Hisashi Kaneko, Masatoshi Higuchi | 1998-06-23 |
| 5575885 | Copper-based metal polishing solution and method for manufacturing semiconductor device | Masatoshi Higuchi | 1996-11-19 |