Issued Patents All Time
Showing 26–50 of 120 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11658037 | Method of atomic layer etching of oxide | Sonam D. Sherpa | 2023-05-23 |
| 11605542 | Method for dry etching compound materials | Peter Ventzek | 2023-03-14 |
| 11605539 | Defect correction on metal resists | Yun Han, Peter L. G. Ventzek | 2023-03-14 |
| 11557487 | Etching metal during processing of a semiconductor structure | Roberto C. Longo Pazos, Peter Ventzek | 2023-01-17 |
| 11545364 | Pulsed capacitively coupled plasma processes | Peter Ventzek, Kensuke Taniguchi, Shinya Morikita | 2023-01-03 |
| 11527413 | Cyclic plasma etch process | Yun Han, Peter L. G. Ventzek | 2022-12-13 |
| 11521834 | Plasma processing systems and methods for chemical processing a substrate | Peter Ventzek, Mitsunori Ohata | 2022-12-06 |
| 11470712 | Plasma processing apparatus | Yohei Yamazawa, Takehisa Saito, Mayo UDA, Keigo Toyoda, Toshiki Nakajima | 2022-10-11 |
| 11398386 | Plasma etch processes | Yusuke Yoshida, Sergey Voronin, Shyam Sridhar, Caitlin Philippi, Christopher Talone | 2022-07-26 |
| 11393663 | Methods and systems for focus ring thickness determinations and feedback control | Merritt Funk, Barton Lane, Peter Ventzek, Justin Moses, Chelsea DuBose | 2022-07-19 |
| 11393662 | Apparatuses and methods for plasma processing | Zhiying Chen, Joel Blakeney, Megan Carruth, Peter Ventzek, Kazuya Nagaseki | 2022-07-19 |
| 11342195 | Methods for anisotropic etch of silicon-based materials with selectivity to organic materials | Yun Han, Peter Ventzek | 2022-05-24 |
| 11264212 | Ion angle detector | Zhiying Chen, Joel Blakeney, Megan Carruth, Peter Ventzek | 2022-03-01 |
| 11257685 | Apparatus and process for electron beam mediated plasma etch and deposition processes | Peter Ventzek | 2022-02-22 |
| 11251021 | Mode-switching plasma systems and methods of operating thereof | Peter Ventzek, Mitsunori Ohata, Michael Hummel | 2022-02-15 |
| 11205576 | Monolayer film mediated precision material etch | Peter Ventzek | 2021-12-21 |
| 11205562 | Hybrid electron beam and RF plasma system for controlled content of radicals and ions | Zhiying Chen, Peter Ventzek | 2021-12-21 |
| 11183398 | Ruthenium hard mask process | Zhiying Chen, Peter L. G. Ventzek | 2021-11-23 |
| 11158516 | Plasma processing methods using low frequency bias pulses | Peter Ventzek, Mitsunori Ohata | 2021-10-26 |
| 11152194 | Plasma processing apparatuses having a dielectric injector | Zhiying Chen, Joel Blakeney, Peter Ventzek, Kazuya Nagaseki | 2021-10-19 |
| 11133194 | Method for selective etching at an interface between materials | Sergey Voronin, Christopher Catano, Nicholas Joy, Christopher Talone | 2021-09-28 |
| 11094543 | Defect correction on metal resists | Yun Han, Peter Ventzek | 2021-08-17 |
| 11079682 | Methods for extreme ultraviolet (EUV) resist patterning development | Yun Han, Peter L. G. Ventzek | 2021-08-03 |
| 11056347 | Method for dry etching compound materials | Peter Ventzek | 2021-07-06 |
| 11043362 | Plasma processing apparatuses including multiple electron sources | Peter Ventzek, Barton Lane, Zhiying Chen | 2021-06-22 |