HM

Hidenori Miyoshi

TL Tokyo Electron Limited: 23 patents #215 of 5,567Top 4%
UC Ube Exsymo Co.: 2 patents #1 of 23Top 5%
EB Ebara: 1 patents #1,014 of 1,611Top 65%
NU National University Corporation Tohoku University: 1 patents #86 of 170Top 55%
NU National University Corporation Nagoya University: 1 patents #247 of 782Top 35%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
Overall (All Time): #158,423 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
12266562 Substrate processing method and substrate processing apparatus Hajime Naito, Shigeki Doba 2025-04-01
12162770 Black powder, and method for producing same Kenta GOTOU 2024-12-10
11679985 Black powder, and method for producing same Kenta GOTOU 2023-06-20
11024514 Etching method and etching apparatus Takuya Abe, Akitaka Shimizu, Koichi Nagakura 2021-06-01
10825688 Method for etching copper layer Shigeru Tahara, Daisuke Urayama, Kenji Matsumoto 2020-11-03
9293417 Method for forming barrier film on wiring line Masamichi Hara 2016-03-22
8999102 Substrate processing apparatus Shuji AZUMO 2015-04-07
8865590 Film forming method, pretreatment device, and processing system Kenji Matsumoto, Hitoshi Itoh, Shigetoshi Hosaka, Hiroshi Sato, Koji Neishi +1 more 2014-10-21
8785311 Film forming method, semiconductor device, manufacturing method thereof and substrate processing apparatus therefor Shuji AZUMO 2014-07-22
8765221 Film forming method and film forming apparatus Hitoshi Itoh, Hiroshi Sato 2014-07-01
8709541 Method for forming a film Kenji Matsumoto 2014-04-29
8653665 Barrier layer, film forming method, and processing system 2014-02-18
8610353 Plasma generating apparatus, plasma processing apparatus and plasma processing method Hitoshi Itoh, Masaru Hori, Hirotaka Toyoda, Makoto Sekine 2013-12-17
8551565 Film forming method and film forming apparatus Isao Gunji, Hitoshi Itoh 2013-10-08
8394231 Plasma process device and plasma process method Koichi Takatsuki, Hikaru Yoshitaka, Shigeo Ashigaki, Yoichi Inoue, Takashi Akahori +7 more 2013-03-12
8354337 Metal oxide film formation method and apparatus Kenji Matsumoto, Hitoshi Itoh, Hiroshi Sato 2013-01-15
8310054 Semiconductor device manufacturing method and target substrate processing system Kazuichi Hayashi 2012-11-13
8138095 Method of substrate treatment, process for producing semiconductor device, substrate treating apparatus, and recording medium 2012-03-20
8114786 Heat treatment method, heat treatment apparatus and substrate processing apparatus 2012-02-14
8029856 Film formation method and apparatus Isao Gunji, Hitoshi Itoh 2011-10-04
8003535 Semiconductor device manufacturing method and target substrate processing system Kazuichi Hayashi 2011-08-23
7772130 Insulation film forming method, insulation film forming system, and semiconductor device manufacturing method Kazuo Komura 2010-08-10
7709394 Substrate processing method and apparatus fabrication process of a semiconductor device Kenji Ishikawa, Yukio Takigawa, Yoshihiro Nakata, Hideki Tateishi 2010-05-04
7556711 Semiconductor device manufacturing apparatus and operating method thereof 2009-07-07
7279434 Material and method for forming low-dielectric-constant film Nobuhiro Hata 2007-10-09