HT

Hideki Tateishi

HI Hitachi: 5 patents #7,555 of 28,497Top 30%
EB Ebara: 3 patents #598 of 1,611Top 40%
AN Anelva: 1 patents #135 of 280Top 50%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
Overall (All Time): #651,500 of 4,157,543Top 20%
8
Patents All Time

Issued Patents All Time

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDate
8357284 Method for forming metal film Akira Susaki, Tsutomu Nakada 2013-01-22
8205625 Apparatus and method for surface treatment of substrate, and substrate processing apparatus and method Tsutomu Nakada, Akira Susaki, Shohei Shima, Yukio Fukunaga 2012-06-26
7709394 Substrate processing method and apparatus fabrication process of a semiconductor device Hidenori Miyoshi, Kenji Ishikawa, Yukio Takigawa, Yoshihiro Nakata 2010-05-04
4853102 Sputtering process and an apparatus for carrying out the same Hiroshi Saito, Shinji Sasaki, Mitsuaki Horiuchi 1989-08-01
4675096 Continuous sputtering apparatus Tamotsu Shimizu, Susumu Aiuchi, Katsuhiro Iwashita, Hiroshi Nakamura 1987-06-23
4610770 Method and apparatus for sputtering Hiroshi Saito, Shigeru Kobayashi, Susumu Aiuchi, Yasumichi Suzuki, Masao Sakata +2 more 1986-09-09
4405435 Apparatus for performing continuous treatment in vacuum Tsuneaki Kamei, Katsuo Abe, Shigeru Kobayashi, Susumu Aiuchi, Masashi Nakatsukasa +2 more 1983-09-20
4401539 Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputtering cathode structure, and method of forming films by use of said sputtering cathode structure Katsuo Abe, Shigeru Kobayashi, Tsuneaki Kamei, Susumu Aiuchi 1983-08-30