MN

Masaru Nishino

TL Tokyo Electron Limited: 12 patents #586 of 5,567Top 15%
NE Nec: 3 patents #4,195 of 14,502Top 30%
TA Tel Manufacturing And Engineering Of America: 2 patents #6 of 26Top 25%
TC Tocalo Co.: 1 patents #41 of 105Top 40%
📍 Rifu, MA: #3 of 7 inventorsTop 45%
Overall (All Time): #270,422 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
11694872 Pattern enhancement using a gas cluster ion beam Kazuya Dobashi, Hiromitsu Kambara, Reo Kosaka, Matthew C. Gwinn, Luis Fernandez +3 more 2023-07-04
11450506 Pattern enhancement using a gas cluster ion beam Kazuya Dobashi, Hiromitsu Kambara, Reo Kosaka, Matthew C. Gwinn, Luis Fernandez +3 more 2022-09-20
9653317 Plasma processing method and plasma processing apparatus Takao FUNAKUBO, Shinichi Kozuka, Ryosuke Niitsuma, Tsutomu Ito 2017-05-16
9305817 Method for purging a substrate container Seiichi Kaise, Shigeki Amemiya, Shinobu Onodera, Hiroki Fujita, Atsushi Rikukawa 2016-04-05
8986493 Etching apparatus Shigeru Tahara 2015-03-24
8896210 Plasma processing apparatus and method Masatsugu Makabe, Nobuyuki Nagayama, Tatsuya Handa, Ryotaro Midorikawa, Keigo Kobayashi +1 more 2014-11-25
8790489 Substrate processing apparatus and substrate processing method Masanobu Honda, Kazuhiro Kubota, Yoshinobu Ooya 2014-07-29
8361275 Etching apparatus Shigeru Tahara 2013-01-29
8252192 Method of pattern etching a dielectric film while removing a mask layer Yao-Sheng Lee, Vaidyanathan Balasubramaniam, Kelvin Zin 2012-08-28
8190023 Optical communication device, optical communication system, optical output control method and program 2012-05-29
7998872 Method for etching a silicon-containing ARC layer to reduce roughness and CD Vinh Luong, Vaidyanathan Balasubramaniam 2011-08-16
7674393 Etching method and apparatus Shigeru Tahara 2010-03-09
7637269 Low damage method for ashing a substrate using CO2/CO-based process Kelvin Zin, Chong Hwan Chu, Yannick Feurprier 2009-12-29
7279427 Damage-free ashing process and system for post low-k etch Douglas M. Trickett 2007-10-09
6986851 Dry developing method Akinori Kitamura, Vaidya Balasubramaniam, Koichiro Inazawa 2006-01-17
6594046 Level-flattening circuit for WDM optical signals 2003-07-15
5963685 Cross-connection of wavelength-division-multiplexed high speed optical channels 1999-10-05