Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10672618 | Systems and methods for patterning features in tantalum nitride (TaN) layer | Isabel Cristina Chu, Ashim Dutta | 2020-06-02 |
| 10260150 | Method and system for sculpting spacer sidewall mask | Akiteru Ko | 2019-04-16 |
| 9978563 | Plasma treatment method to meet line edge roughness and other integration objectives | Akiteru Ko | 2018-05-22 |
| 9899219 | Trimming inorganic resists with selected etchant gas mixture and modulation of operating variables | Akiteru Ko | 2018-02-20 |
| 8501628 | Differential metal gate etching process | Hiroyuki Takahashi, Akiteru Ko, Asao Yamashita, Vaidya Bharadwaj, Takashi Enomoto +1 more | 2013-08-06 |
| 8389416 | Process for etching silicon with selectivity to silicon-germanium | — | 2013-03-05 |
| 8334083 | Etch process for controlling pattern CD and integrity in multi-layer masks | Akiteru Ko | 2012-12-18 |
| 8313661 | Deep trench liner removal process | Akiteru Ko | 2012-11-20 |
| 7998872 | Method for etching a silicon-containing ARC layer to reduce roughness and CD | Masaru Nishino, Vaidyanathan Balasubramaniam | 2011-08-16 |