Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7481230 | Plasma processing method and apparatus | — | 2009-01-27 |
| 6465359 | Etchant for use in a semiconductor processing method and system | Masahiro Yamada, Youbun Ito, Kouichiro Inazawa, Abron Toure, Kunihiko Hinata | 2002-10-15 |
| 6455411 | Defect and etch rate control in trench etch for dual damascene patterning of low-k dielectrics | Ping Jiang, Francis G. Celii, Kenneth Newton | 2002-09-24 |
| 6159862 | Semiconductor processing method and system using C.sub.5 F.sub.8 | Masahiro Yamada, Youbun Ito, Kouichiro Inazawa, Abron Toure, Kunihiko Hinata | 2000-12-12 |
| 5556500 | Plasma etching apparatus | Makoto Hasegawa, Hiromitsu Kanbara, Yoshio Ishikawa, Yasuo Imamura, Makoto Aoki | 1996-09-17 |