Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7743731 | Reduced contaminant gas injection system and method of using | Takashi Enomoto, Akiteru Ko, Shinji Hamamoto, Masafumi Urakawa, Arthur Laflamme +1 more | 2010-06-29 |
| 7709397 | Method and system for etching a high-k dielectric material | Lee Chen, Hiromitsu Kambara, Nobuhiro Iwama, Akiteru Ko, Hiromasa Mochiki | 2010-05-04 |
| 7700494 | Low-pressure removal of photoresist and etch residue | Vaidyanathan Balasubramaniam, Eiichi Nishimura, Koichiro Inazawa | 2010-04-20 |
| 7582220 | Etching method | Mitsuru Ishikawa, Koichiro Inazawa | 2009-09-01 |
| 7465673 | Method and apparatus for bilayer photoresist dry development | Yoshiki Igarashi, Kouichiro Inazawa, Kimihiro Higuchi, Vaidyanathan Balasubramaniam, Eiichi Nishimura +2 more | 2008-12-16 |
| 7344993 | Low-pressure removal of photoresist and etch residue | Vaidyanathan Balasubramaniam, Yasunori Hatamura, Eiichi Nishimura, Koichiro Inazawa | 2008-03-18 |
| 7211197 | Etching method and plasma processing method | Koichiro Inazawa, Wakako Naito | 2007-05-01 |
| 6780342 | Method of etching and method of plasma treatment | Koichiro Inazawa, Wakako Naito | 2004-08-24 |