Issued Patents All Time
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10978275 | Manufacturing method of showerhead for plasma processing apparatus | Yoshitaka Tamura | 2021-04-13 |
| D911985 | Gas introduction plate for plasma etching apparatus for etching semiconductor wafer | Yoshitaka Tamura | 2021-03-02 |
| 9048191 | Plasma etching method | Shuichiro Uda, Shinji Fuchigami, Koji Maruyama | 2015-06-02 |
| 7767055 | Capacitive coupling plasma processing apparatus | Shinji Himori, Noriaki Imai, Katsumi Horiguchi, Shoichiro Matsuyama, Hiroki Matsumaru +5 more | 2010-08-03 |
| 7678225 | Focus ring for semiconductor treatment and plasma treatment device | Katsumi Horiguchi, Daisuke Hayashi, Toshiya Tsukahara | 2010-03-16 |