Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11195697 | Plasma control apparatus | Ryosuke Fujii | 2021-12-07 |
| 10854431 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2020-12-01 |
| 10546727 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2020-01-28 |
| 10529539 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +10 more | 2020-01-07 |
| 9490105 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2016-11-08 |
| 9199303 | Metal filling apparatus | Yukitaka Yamaguchi, Toshiji Takigawa, Osamu Imai | 2015-12-01 |
| 8852388 | Plasma processor | — | 2014-10-07 |
| 8771461 | Plasma processing apparatus | Yasuyuki Hayashi | 2014-07-08 |
| 8628640 | Plasma processing unit and high-frequency electric power supplying unit | Masahide Iwasaki, Junichi Takahira, Kazuyoshi Watanabe, Shinichi Komatsu, Yuichi Sasaki | 2014-01-14 |
| 8603293 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2013-12-10 |
| 8286581 | High frequency power source and its control method, and plasma processing apparatus | Takeshi Ohse, Jun-Ichi Takahira, Jun Shimada | 2012-10-16 |
| 8157952 | Plasma processing chamber, potential controlling apparatus, potential controlling method, program for implementing the method, and storage medium storing the program | Masanobu Honda | 2012-04-17 |
| 8038833 | Plasma processing apparatus | Satoshi Maebashi, Naoyuki Umehara | 2011-10-18 |
| 7988816 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2011-08-02 |
| 7951262 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +10 more | 2011-05-31 |
| 7895970 | Structure for plasma processing chamber, plasma processing chamber, plasma processing apparatus, and plasma processing chamber component | Masanobu Honda, Yutaka Matsui | 2011-03-01 |
| 7870751 | Temperature control system and substrate processing apparatus | Kengo Kaneko | 2011-01-18 |
| 7815740 | Substrate mounting table, substrate processing apparatus and substrate processing method | Kaoru Oohashi | 2010-10-19 |
| 7767055 | Capacitive coupling plasma processing apparatus | Shinji Himori, Noriaki Imai, Katsumi Horiguchi, Takaaki Nezu, Shoichiro Matsuyama +5 more | 2010-08-03 |
| 7718007 | Substrate supporting member and substrate processing apparatus | Kaoru Oohashi | 2010-05-18 |
| 7368876 | Plasma processing apparatus | Etsuji Ito, Itsuko Sakai | 2008-05-06 |
| 7008275 | Electrical joint forming member and plasma processing apparatus | Naoyuki Umehara, Tsuyoshi Hasegawa | 2006-03-07 |
| 6669810 | Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof | Toshiya Miyazaki, Tadao Nakatsuka, Hiroyuki Tanaka, Toshiyuki Nakamura | 2003-12-30 |
| 6149761 | Etching apparatus and etching system using the method thereof | Toshiya Miyazaki, Tadao Nakatsuka, Hiroyuki Tanaka, Toshiyuki Nakamura | 2000-11-21 |
| 6092486 | Plasma processing apparatus and plasma processing method | Hiroshi Mabuchi, Shigeki Honda | 2000-07-25 |