Issued Patents All Time
Showing 26–33 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6274512 | Method for manufacturing a semiconductor device | Hisataka Hayashi, Katsuya Okumura | 2001-08-14 |
| 5998100 | Fabrication process using a multi-layer antireflective layer | Tsukasa Azuma, Tetsuo Matsuda, David M. Dobuzinsky, Katsuya Okumura | 1999-12-07 |
| 5874363 | Polycide etching with HCL and chlorine | Peter D. Hoh, Virinder Grewal, Bruno Spuler, Waldemar Walter Kocon, Guadalupe Wiltshire | 1999-02-23 |
| 5759746 | Fabrication process using a thin resist | Tsukasa Azuma, Tetsuo Matsuda, David M. Dobuzinsky, Katsuya Okumura | 1998-06-02 |
| 5756402 | Method of etching silicon nitride film | Sadayuki Jimbo, Haruki Mori, Akira Kobayashi, Tadashi Shinmura, Yasuyuki Taniguchi | 1998-05-26 |
| 5658389 | Thin film forming method and apparatus | Tetsuo Matsuda, Haruo Okano | 1997-08-19 |
| 5310454 | Dry etching method | Hisataka Hayashi, Keiji Horioka, Haruo Okano, Takaya Matsushita, Isahiro Hasegawa +1 more | 1994-05-10 |
| 5094879 | Method of activating at least one gas to produce different charged species, selecting specific species, decelerating the species, and chemically reacting the species to form a thin film | Tetsuo Matsuda, Haruo Okano | 1992-03-10 |