| 7855137 |
Method of making a sidewall-protected metallic pillar on a semiconductor substrate |
Mukta G. Farooq, Kevin S. Petrarca, Richard P. Volant |
2010-12-21 |
| 6461529 |
Anisotropic nitride etch process with high selectivity to oxide and photoresist layers in a damascene etch scheme |
Diane C. Boyd, Stuart M. Burns, Hussein I. Hanafi, William C. Wille, Richard S. Wise |
2002-10-08 |
| 6375859 |
Process for resist clean up of metal structures on polyimide |
Richard P. Volant, Joseph T. Kocis, Seshadri Subbanna |
2002-04-23 |
| 6268226 |
Reactive ion etch loading measurement technique |
David Angell, Stuart M. Burns, Michael L. Passow |
2001-07-31 |
| 6077745 |
Self-aligned diffused source vertical transistors with stack capacitors in a 4F-square memory cell array |
Stuart M. Burns, Hussein I. Hanafi, Jeffrey J. Welser, Howard L. Kalter |
2000-06-20 |
| 6034389 |
Self-aligned diffused source vertical transistors with deep trench capacitors in a 4F-square memory cell array |
Stuart M. Burns, Hussein I. Hanafi, Howard L. Kalter, Jeffrey J. Welser |
2000-03-07 |
| 6033957 |
4F-square memory cell having vertical floating-gate transistors with self-aligned shallow trench isolation |
Stuart M. Burns, Hussein I. Hanafi, Jeffrey J. Welser |
2000-03-07 |
| 6013548 |
Self-aligned diffused source vertical transistors with deep trench capacitors in a 4F-square memory cell array |
Stuart M. Burns, Hussein I. Hanafi, Howard L. Kalter, Jeffrey J. Welser |
2000-01-11 |
| 5929477 |
Self-aligned diffused source vertical transistors with stack capacitors in a 4F-square memory cell array |
Stuart McAllister Burns, Jr., Hussein I. Hanafi, Jeffrey J. Welser, Howard L. Kalter |
1999-07-27 |
| 5895273 |
Silicon sidewall etching |
Stuart M. Burns, Hussein I. Hanafi, Jeffrey J. Welser |
1999-04-20 |
| 5874760 |
4F-square memory cell having vertical floating-gate transistors with self-aligned shallow trench isolation |
Stuart M. Burns, Hussein I. Hanafi, Jeffrey J. Welser |
1999-02-23 |
| 5874363 |
Polycide etching with HCL and chlorine |
Peter D. Hoh, Tokuhisa Ohiwa, Virinder Grewal, Bruno Spuler, Guadalupe Wiltshire |
1999-02-23 |
| 5759920 |
Process for making doped polysilicon layers on sidewalls |
Stuart M. Burns, Hussein I. Hanafi |
1998-06-02 |
| 5670018 |
Isotropic silicon etch process that is highly selective to tungsten |
Elke Eckstein, Birgit Hoffman, deceased, Edward W. Kiewra, Marc Jay Weiss |
1997-09-23 |