| 6593617 |
Field effect transistors with vertical gate side walls and method for making such transistors |
Diane C. Boyd, Hussein I. Hanafi, Yuan Taur, William C. Wille |
2003-07-15 |
| 6461529 |
Anisotropic nitride etch process with high selectivity to oxide and photoresist layers in a damascene etch scheme |
Diane C. Boyd, Hussein I. Hanafi, Waldemar Walter Kocon, William C. Wille, Richard S. Wise |
2002-10-08 |
| 6268226 |
Reactive ion etch loading measurement technique |
David Angell, Waldemar Walter Kocon, Michael L. Passow |
2001-07-31 |
| 6258679 |
Sacrificial silicon sidewall for damascene gate formation |
Hussein I. Hanafi |
2001-07-10 |
| 6143635 |
Field effect transistors with improved implants and method for making such transistors |
Diane C. Boyd, Hussein I. Hanafi, Yuan Taur, William C. Wille |
2000-11-07 |
| 6077745 |
Self-aligned diffused source vertical transistors with stack capacitors in a 4F-square memory cell array |
Hussein I. Hanafi, Jeffrey J. Welser, Waldemar Walter Kocon, Howard L. Kalter |
2000-06-20 |
| 6040214 |
Method for making field effect transistors having sub-lithographic gates with vertical side walls |
Diane C. Boyd, Hussein I. Hanafi, Yuan Taur, William C. Wille |
2000-03-21 |
| 6040210 |
2F-square memory cell for gigabit memory applications |
Hussein I. Hanafi |
2000-03-21 |
| 6033957 |
4F-square memory cell having vertical floating-gate transistors with self-aligned shallow trench isolation |
Hussein I. Hanafi, Jeffrey J. Welser, Waldemar Walter Kocon |
2000-03-07 |
| 6034389 |
Self-aligned diffused source vertical transistors with deep trench capacitors in a 4F-square memory cell array |
Hussein I. Hanafi, Howard L. Kalter, Jeffrey J. Welser, Waldemar Walter Kocon |
2000-03-07 |
| 6013548 |
Self-aligned diffused source vertical transistors with deep trench capacitors in a 4F-square memory cell array |
Hussein I. Hanafi, Howard L. Kalter, Jeffrey J. Welser, Waldemar Walter Kocon |
2000-01-11 |
| 5990509 |
2F-square memory cell for gigabit memory applications |
Hussein J. Hanafi, Jeffrey J. Welser |
1999-11-23 |
| 5976986 |
Low pressure and low power C1.sub.2 /HC1 process for sub-micron metal etching |
Munir D. Naeem, Rosemary Christie, Virinder Grewal, Walter W. Kocon, Masaki Narita +2 more |
1999-11-02 |
| 5895273 |
Silicon sidewall etching |
Hussein I. Hanafi, Waldemar Walter Kocon, Jeffrey J. Welser |
1999-04-20 |
| 5874760 |
4F-square memory cell having vertical floating-gate transistors with self-aligned shallow trench isolation |
Hussein I. Hanafi, Jeffrey J. Welser, Waldemar Walter Kocon |
1999-02-23 |
| 5846884 |
Methods for metal etching with reduced sidewall build up during integrated circuit manufacturing |
Munir D. Naeem, Nancy Anne Greco, STEVE GRECO, Virinder Grewal, Ernest N. Levine +2 more |
1998-12-08 |
| 5759920 |
Process for making doped polysilicon layers on sidewalls |
Hussein I. Hanafi, Waldemar Walter Kocon |
1998-06-02 |