| 6759710 |
Self-aligned double-gate MOSFET by selective epitaxy and silicon wafer bonding techniques |
Kevin K. Chan, Guy M. Cohen, Hon-Sum Philip Wong |
2004-07-06 |
| 6593617 |
Field effect transistors with vertical gate side walls and method for making such transistors |
Diane C. Boyd, Stuart M. Burns, Hussein I. Hanafi, William C. Wille |
2003-07-15 |
| 6365465 |
Self-aligned double-gate MOSFET by selective epitaxy and silicon wafer bonding techniques |
Kevin K. Chan, Guy M. Cohen, Hon-Sum Philip Wong |
2002-04-02 |
| 6268640 |
Forming steep lateral doping distribution at source/drain junctions |
Heemyong Park, Hsing-Jen Wann |
2001-07-31 |
| 6143635 |
Field effect transistors with improved implants and method for making such transistors |
Diane C. Boyd, Stuart M. Burns, Hussein I. Hanafi, William C. Wille |
2000-11-07 |
| 6040214 |
Method for making field effect transistors having sub-lithographic gates with vertical side walls |
Diane C. Boyd, Stuart M. Burns, Hussein I. Hanafi, William C. Wille |
2000-03-21 |
| 5780327 |
Vertical double-gate field effect transistor |
Jack O. Chu, Louis L. Hsu, Jack A. Mandelman, Yuan-Chen Sun |
1998-07-14 |
| 5767549 |
SOI CMOS structure |
Wei Chen, Devendra K. Sadana |
1998-06-16 |
| 5689127 |
Vertical double-gate field effect transistor |
Jack O. Chu, Louis L. Hsu, Jack A. Mandelman, Yuan-Chen Sun |
1997-11-18 |
| 5646058 |
Method for fabricating a self-aligned double-gate MOSFET by selective lateral epitaxy |
Hon-Sum Philip Wong |
1997-07-08 |
| 5604368 |
Self-aligned double-gate MOSFET by selective lateral epitaxy |
Hon-Sum Philip Wong |
1997-02-18 |
| 5541427 |
SRAM cell with capacitor |
Barbara A. Chappell, Bijan Davari, George A. Sai-Halasz |
1996-07-30 |
| 5298786 |
SOI lateral bipolar transistor with edge-strapped base contact and method of fabricating same |
Ghavam G. Shahidi, Denny Tang |
1994-03-29 |
| 4585342 |
System for real-time monitoring the characteristics, variations and alignment errors of lithography structures |
Burn Jeng Lin |
1986-04-29 |
| 4509991 |
Single mask process for fabricating CMOS structure |
— |
1985-04-09 |