Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10815567 | Deposition device and deposition method | Katsuhito Hirose, Kenji Suzuki, Takeshi Shinohara | 2020-10-27 |
| 8785310 | Method of forming conformal metal silicide films | Toshio Hasegawa, Hideaki Yamasaki, David L. O'Meara, Gerrit J. Leusink | 2014-07-22 |
| 8257790 | Ti-containing film formation method and storage medium | Kensaku Narushima, Satoshi Wakabayashi | 2012-09-04 |
| 8124168 | Substrate processing method and substrate processing apparatus | Hiroyuki Miyashita, Isao Gunji | 2012-02-28 |
| 8106335 | Processing apparatus and heater unit | Seishi Murakami | 2012-01-31 |
| 7737005 | Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program | Kensaku Narushima, Satoshi Wakabayashi | 2010-06-15 |
| 7484513 | Method of forming titanium film by CVD | Hayashi Otsuki | 2009-02-03 |
| 7153773 | TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system | Hayashi Otsuki, Kimihiro Matsuse | 2006-12-26 |
| 6919273 | Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film | Hayashi Otsuki, Kimihiro Matsuse | 2005-07-19 |
| 6841203 | Method of forming titanium film by CVD | Hayashi Otsuki | 2005-01-11 |
| 6537621 | Method of forming a titanium film and a barrier film on a surface of a substrate through lamination | Yasuo Kobayashi, Hideki Yoshikawa | 2003-03-25 |
| 6451388 | Method of forming titanium film by chemical vapor deposition | Hayashi Otsuki | 2002-09-17 |
| 6197674 | CVD-Ti film forming method | Hideki Yoshikawa, Yasuo Kobayashi | 2001-03-06 |
| 6177149 | Method of forming titanium film by CVD | Hayashi Otsuki | 2001-01-23 |
| 6069093 | Process of forming metal films and multi layer structure | Satoshi Wakabayashi | 2000-05-30 |
| 6051281 | Method of forming a titanium film and a barrier metal film on a surface of a substrate through lamination | Yasuo Kobayashi, Hideki Yoshikawa | 2000-04-18 |
| 6004872 | Method of manufacturing semiconductor device | Yoshihiro Tezuka | 1999-12-21 |
| 5942282 | Method for depositing a titanium film | Yoshihiro Tezuka, Kazuichi Hayashi | 1999-08-24 |
| 5709757 | Film forming and dry cleaning apparatus and method | Tatsuo Hatano, Seishi Murakami | 1998-01-20 |