Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8100147 | Particle-measuring system and particle-measuring method | Tsukasa Matsuda, Kyoko Ikeda | 2012-01-24 |
| 7931945 | Film forming method | Tsukasa Matsuda, Kyoko Ikeda | 2011-04-26 |
| 7894059 | Film formation processing apparatus and method for determining an end-point of a cleaning process | Tsukasa Matsuda, Kyoko Ikeda | 2011-02-22 |
| 7879179 | Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film | — | 2011-02-01 |
| 7846291 | Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film | — | 2010-12-07 |
| 7829144 | Method of forming a metal film for electrode | Kimihiro Matsuse | 2010-11-09 |
| 7828016 | Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus | Yutaka Miura | 2010-11-09 |
| 7667840 | Particle-measuring system and particle-measuring method | Tsukasa Matsuda, Kyoko Ikeda | 2010-02-23 |
| 7515264 | Particle-measuring system and particle-measuring method | Tsukasa Matsuda, Kyoko Ikeda | 2009-04-07 |
| 7511814 | Particle-measuring system and particle-measuring method | Tsukasa Matsuda, Kyoko Ikeda | 2009-03-31 |
| 7484513 | Method of forming titanium film by CVD | Kunihiro Tada | 2009-02-03 |
| 7410923 | SiC material, semiconductor device fabricating system and SiC material forming method | Satoru Nogami | 2008-08-12 |
| 7153773 | TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system | Kunihiro Tada, Kimihiro Matsuse | 2006-12-26 |
| 6936102 | SiC material, semiconductor processing equipment and method of preparing SiC material therefor | Satoru Nogami | 2005-08-30 |
| 6919273 | Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film | Kunihiro Tada, Kimihiro Matsuse | 2005-07-19 |
| 6861356 | Method of forming a barrier film and method of forming wiring structure and electrodes of semiconductor device having a barrier film | Kimihiro Matsuse | 2005-03-01 |
| 6841203 | Method of forming titanium film by CVD | Kunihiro Tada | 2005-01-11 |
| 6838376 | Method of forming semiconductor wiring structures | Kimihiro Matsuse | 2005-01-04 |
| 6824825 | Method for depositing metallic nitride series thin film | — | 2004-11-30 |
| 6817381 | Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus | Yutaka Miura | 2004-11-16 |
| 6532069 | Particle-measuring system and particle-measuring method | Tsukasa Matsuda, Kyoko Ikeda | 2003-03-11 |
| 6451388 | Method of forming titanium film by chemical vapor deposition | Kunihiro Tada | 2002-09-17 |
| 6177149 | Method of forming titanium film by CVD | Kunihiro Tada | 2001-01-23 |
| 5474641 | Processing method and apparatus thereof | Yoichi Deguchi | 1995-12-12 |