Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7427426 | CVD method for forming metal film by using metal carbonyl gas | Tatsuo Hatano | 2008-09-23 |
| 7361595 | Transition metal thin film forming method | Susumu Arima, Yumiko Kawano | 2008-04-22 |
| 7344754 | Film formation method | Tatsuo Hatano, Yumiko Kawano | 2008-03-18 |
| 7189431 | Method for forming a passivated metal layer | Kazuhito Nakamura, Yumiko Kawano, Gert Leusink, Fenton R. McFeely, Paul C. Jamison | 2007-03-13 |
| 7078341 | Method of depositing metal layers from metal-carbonyl precursors | Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Masahito Sugiura, Yumiko Kawano +3 more | 2006-07-18 |
| 7067422 | Method of forming a tantalum-containing gate electrode structure | Kazuhito Nakamura, Yumiko Kawano, Gert Leusink, Fenton R. McFeely, John J. Yurkas +1 more | 2006-06-27 |
| 7063871 | CVD process capable of reducing incubation time | Tatsuo Hatano, Tsukasa Matsuda, Taro Ikeda, Kazuhito Nakamura, Koumei Matsuzawa +2 more | 2006-06-20 |
| 6989321 | Low-pressure deposition of metal layers from metal-carbonyl precursors | Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Masahito Sugiura, Yumiko Kawano +3 more | 2006-01-24 |
| 6966936 | Processing system, evacuating system for processing system, low-pressure CVD system, and evacuating system and trapping device for low-pressure CVD system | Yumiko Kawano, Kenichi Kubo, Susumu Arima | 2005-11-22 |
| 6924223 | Method of forming a metal layer using an intermittent precursor gas flow process | Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Mitsuhiro Tachibana, Koumei Matsuzava +6 more | 2005-08-02 |
| 6919268 | Method of manufacturing a WN contact plug | Yumiko Kawano | 2005-07-19 |
| 6913996 | Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring | Mitsuhiro Tachibana, Kazuya Okubo, Kenji Suzuki, Yumiko Kawano | 2005-07-05 |
| 6846711 | Method of making a metal oxide capacitor, including a barrier film | Yumiko Kawano | 2005-01-25 |
| 6797068 | Film forming unit | Takashi Mochizuki, Susumu Arima, Yumiko Kawano | 2004-09-28 |
| 6548398 | Production method of semiconductor device and production device therefor | — | 2003-04-15 |
| 6548112 | Apparatus and method for delivery of precursor vapor from low vapor pressure liquid sources to a CVD chamber | Joseph T. Hillman, Tugrul Yasar, Kenichi Kubo, Vincent Vezin, Yasuhiko Kojima +2 more | 2003-04-15 |
| 6489198 | Semiconductor device and method of manufacturing the same | Yumiko Kawano | 2002-12-03 |
| 6486063 | Semiconductor device manufacturing method for a copper connection | Yumiko Kawano | 2002-11-26 |
| 6436203 | CVD apparatus and CVD method | Takeshi Kaizuka, Takashi Horiuchi, Masami Mizukami, Takashi Mochizuki, Yumiko Kawano | 2002-08-20 |
| 6399484 | Semiconductor device fabricating method and system for carrying out the same | Satoshi Yonezawa, Susumu Arima, Yumiko Kawano, Mitsuhiro Tachibana, Keizo Hosoda | 2002-06-04 |
| 6089184 | CVD apparatus and CVD method | Takeshi Kaizuka, Takashi Horiuchi, Masami Mizukami, Takashi Mochizuki, Yumiko Kawano | 2000-07-18 |