Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10388524 | Film forming method, boron film, and film forming apparatus | Hirokazu Ueda, Masahiro Oka, Yoshimasa Watanabe, Syuhei Yonezawa | 2019-08-20 |
| 8936829 | Method of aftertreatment of amorphous hydrocarbon film and method for manufacturing electronic device by using the aftertreatment method | — | 2015-01-20 |
| 8809207 | Pattern-forming method and method for manufacturing semiconductor device | Teruyuki Hayashi, Takaaki Matsuoka, Yuji Ono | 2014-08-19 |
| 8741396 | Method for forming amorphous carbon nitride film, amorphous carbon nitride film, multilayer resist film, method for manufacturing semiconductor device, and storage medium in which control program is stored | Eiichi Nishimura | 2014-06-03 |
| 8674397 | Sealing film forming method, sealing film forming device, and light-emitting device | Teruyuki Hayashi | 2014-03-18 |
| 8461047 | Method for processing amorphous carbon film, and semiconductor device manufacturing method using the method | Takaaki Matsuoka | 2013-06-11 |
| 8409460 | Forming method of amorphous carbon film, amorphous carbon film, multilayer resist film, manufacturing method of semiconductor device, and computer-readable storage medium | Tadakazu Murai, Eisuke Morisaki | 2013-04-02 |
| 8377818 | Aftertreatment method for amorphous carbon film | — | 2013-02-19 |
| 8262844 | Plasma processing apparatus, plasma processing method and storage medium | Yasuhiro Tobe | 2012-09-11 |
| 8017519 | Semiconductor device and manufacturing method thereof | — | 2011-09-13 |
| 7842356 | Substrate processing methods | — | 2010-11-30 |
| 7658799 | Plasma film-forming apparatus and plasma film-forming method | — | 2010-02-09 |
| 6716725 | Plasma processing method and semiconductor device | — | 2004-04-06 |
| 6528410 | Method for manufacturing semiconductor device | Tatsuya Usami | 2003-03-04 |
| 6319847 | Semiconductor device using a thermal treatment of the device in a pressurized steam ambient as a planarization technique | — | 2001-11-20 |
| 6277706 | Method of manufacturing isolation trenches using silicon nitride liner | — | 2001-08-21 |
| 6239016 | Multilevel interconnection in a semiconductor device and method for forming the same | — | 2001-05-29 |
| 6157083 | Fluorine doping concentrations in a multi-structure semiconductor device | Tatsuya Usami | 2000-12-05 |
| 6071832 | Method for manufacturing a reliable semiconductor device using ECR-CVD and implanting hydrogen ions into an active region | — | 2000-06-06 |
| 5894170 | Wiring layer in semiconductor device | — | 1999-04-13 |
| 5882975 | Method of fabricating salicide-structure semiconductor device | — | 1999-03-16 |
| 5861674 | Multilevel interconnection in a semiconductor device and method for forming the same | — | 1999-01-19 |
| 5751050 | Semiconductor device having a polysilicon resistor element with increased stability and method of fabricating same | Tatsuya Usami | 1998-05-12 |
| 5723386 | Method of manufacturing a semiconductor device capable of rapidly forming minute wirings without etching of the minute wirings | — | 1998-03-03 |
| 5633208 | Planarization of insulation film using low wettingness surface | — | 1997-05-27 |