Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9587208 | Cleaning liquid composition, method for cleaning semiconductor element, and method for manufacturing semiconductor element | Kenji Shimada, Hiroshi Yoshida, Masaru Ohto | 2017-03-07 |
| 8859411 | Method for producing transistor | Kenji Shimada, Hiroshi Matsunaga, Kenji Yamada | 2014-10-14 |
| 8802608 | Composition for cleaning and rust prevention and process for producing semiconductor element or display element | Kenji Shimada, Hiroshi Matsunaga, Kenji Yamada | 2014-08-12 |
| 8658053 | Etching composition for metal material and method for manufacturing semiconductor device by using same | Kazuyoshi Yaguchi, Masaru Ohto | 2014-02-25 |
| 7998914 | Cleaning solution for semiconductor device or display device, and cleaning method | Kenji Shimada | 2011-08-16 |
| 7572758 | Cleaning liquid and cleaning method | Kenji Shimada, Masaru Ohto, Hiroshi Matsunaga | 2009-08-11 |
| 6875288 | Cleaning agent and cleaning method | Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara +4 more | 2005-04-05 |
| 6514352 | Cleaning method using an oxidizing agent, chelating agent and fluorine compound | Hideto Gotoh, Takayuki Niuya, Hiroyuki Mori, Hiroshi Matsunaga, Fukusaburo Ishihara +4 more | 2003-02-04 |
| 6372410 | Resist stripping composition | Kazuto Ikemoto, Tetsuo Aoyama | 2002-04-16 |
| 6323169 | Resist stripping composition and process for stripping resist | Hideki Fukuda, Hisaki Abe, Taketo Maruyama | 2001-11-27 |
| 6265309 | Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same | Hideto Gotoh, Tsuyoshi Matsui, Takayuki Niuya, Tetsuo Aoyama, Taketo Maruyama +3 more | 2001-07-24 |