HA

Hisaki Abe

MC Mitsubishi Gas Chemical Company: 9 patents #212 of 1,727Top 15%
Sharp Kabushiki Kaisha: 4 patents #3,475 of 10,731Top 35%
Overall (All Time): #586,417 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
6815150 Photoresist stripping composition and process for stripping resist Hijiri Nakahara, Yukihiko Takeuchi, Ryou Hashimoto, Taketo Maruyama 2004-11-09
6686322 Cleaning agent and cleaning process using the same Masahiro Nohara, Ryou Hashimoto, Taimi Oketani, Taketo Maruyama, Tetsuo Aoyama 2004-02-03
6638694 Resist stripping agent and process of producing semiconductor devices using the same Kazuto Ikemoto, Taketo Maruyama, Tetsuo Aoyama 2003-10-28
6500270 Resist film removing composition and method for manufacturing thin film circuit element using the composition Masahiro Nohara, Yukihiko Takeuchi, Taimi Oketani, Taketo Maruyama, Tetsuya Karita +1 more 2002-12-31
6458517 Photoresist stripping composition and process for stripping photoresist Masahiro Nohara, Yukihiko Takeuchi, Taketo Maruyama, Tetsuo Aoyama 2002-10-01
6440326 Photoresist removing composition Taketo Maruyama, Tetsuya Karita, Tetsuo Aoyama 2002-08-27
6323169 Resist stripping composition and process for stripping resist Kojiro Abe, Hideki Fukuda, Taketo Maruyama 2001-11-27
5338462 Active carbon materials, process for the preparation thereof and the use thereof Toshio Kondoh, Hideki Fukuda, Mayumi Takahashi, Tetsuo Aoyama, Masahiro Miyake 1994-08-16
5242879 Active carbon materials, process for the preparation thereof and the use thereof Toshio Kondoh, Hideki Fukuda, Mayumi Takahashi, Tetsuo Aoyama, Masahiro Miyake 1993-09-07