TA

Tetsuo Aoyama

MC Mitsubishi Gas Chemical Company: 28 patents #19 of 1,727Top 2%
Sharp Kabushiki Kaisha: 4 patents #3,475 of 10,731Top 35%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
TI Texas Instruments: 2 patents #5,248 of 12,488Top 45%
SC Sanyo Semiconductor Co.: 1 patents #143 of 323Top 45%
ET Ekc Technology: 1 patents #41 of 87Top 50%
Sumitomo Electric Industries: 1 patents #13,249 of 21,551Top 65%
SO Sony: 1 patents #17,262 of 25,231Top 70%
SC Sanyo Semiconductor Manufacturing Co.: 1 patents #12 of 24Top 50%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
RT Renesas Technology: 1 patents #1,991 of 3,337Top 60%
SC Sanyo Electric Co.: 1 patents #3,644 of 6,347Top 60%
Overall (All Time): #108,692 of 4,157,543Top 3%
33
Patents All Time

Issued Patents All Time

Showing 26–33 of 33 patents

Patent #TitleCo-InventorsDate
5174816 Surface treating agent for aluminum line pattern substrate Mayumi Takahashi, Toshio Kondo, Hideki Fukuda 1992-12-29
5175078 Positive type photoresist developer Susumu Kaneko 1992-12-29
4776929 Process for production of quaternary ammonium hydroxides Eiji Shima, Jiro Ishikawa, Naoto Sakurai 1988-10-11
4613684 Process for the preparation of carboxylic acid esters Koichi Kida, Takako Uchiyama 1986-09-23
4521638 Process for preparation of tertiary olefins Koichi Kida, Takako Uchiyama 1985-06-04
4230636 Process for producing dimethyl formamide Masao Saito, Shigeru Horie, Kazuo Takada 1980-10-28
4224243 Process for producing dimethyl formamide Shigeru Horie, Kozo Sano, Hidetaka Kiga, Kinichi Mizuno, Takeo Ikarashi 1980-09-23
4218398 Process for producing dimethylformamide Masao Saito, Kinichi Mizuno, Yuzi Onda, Kumiko Kato 1980-08-19