Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12051631 | Stacked semiconductor device with removable probe pads | — | 2024-07-30 |
| 8258630 | Semiconductor device and method of manufacturing the same | — | 2012-09-04 |
| 7919803 | Semiconductor memory device having a capacitor structure with a desired capacitance and manufacturing method therefor | — | 2011-04-05 |
| 7494864 | Method for production of semiconductor device | — | 2009-02-24 |
| 7332395 | Method of manufacturing a capacitor | — | 2008-02-19 |
| 6837963 | Semiconductor device, method of producing a semiconductor device, and semiconductor substrate cleaning apparatus used for the production method | Hiroshi Tanaka, Yasuhiro Asaoka, Seiji Muranaka, Toshihiko Nagai | 2005-01-04 |
| 6730239 | Cleaning agent for semiconductor device & method of fabricating semiconductor device | Itaru Kanno, Hiroshi Morita, Naoki Ichiki, Hideaki Nezu, Masayuki Takashima | 2004-05-04 |
| 6642142 | Substrate cleaning method and method for producing an electronic device | Toshihiko Nagai, Hiroshi Tanaka, Yasuhiro Asaoka, Seiji Muranaka | 2003-11-04 |
| 6596630 | Method of cleaning a silicon substrate after blanket depositing a tungsten film by dipping in a solution of hydrofluoric acid, hydrochloric acid, and/or ammonium hydroxide | — | 2003-07-22 |
| 6586145 | Method of fabricating semiconductor device and semiconductor device | Hiroshi Tanaka, Yasuhiro Asaoka, Seiji Muranaka, Toshihiko Nagai | 2003-07-01 |
| 6531381 | Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor device | Yasuhiro Asaoka, Hiroshi Tanaka, Seiji Muranaka, Toshihiko Nagai | 2003-03-11 |
| 6482750 | Method of manufacturing semiconductor device including a cleaning step, and semiconductor device manufactured thereby | — | 2002-11-19 |
| 6432815 | METHOD OF CLEANING A SILICON SUBSTRATE AFTER BLANKET DEPOSITING A TUNGSTEN FILM BY DIPPING IN A SOLUTION HAVING HYDROFLUORIC ACID, HYDROCHLORIC ACID, AND/OR AMMONIUM HYDROXIDE PRIOR TO PATTERNING THE TUNGSTEN FILM | — | 2002-08-13 |
| 6391113 | Semiconductor wafer processing apparatus and method of controlling the same | Toko Konishi | 2002-05-21 |
| 6032382 | Drying apparatus and method using IPA of a semiconductor wafer | Akinori Matsumoto, Takeshi Kuroda, Cozy Ban, Toko Konishi | 2000-03-07 |
| 5996242 | Drying apparatus and method | Akinori Matsumoto, Takeshi Kuroda, Cozy Ban, Toko Konishi | 1999-12-07 |
| 5956859 | Drying apparatus for processing surface of substrate | Akinori Matsumoto, Takeshi Kuroda, Cozy Ban, Toko Konishi | 1999-09-28 |
| 4603970 | Apparatus for inhibiting copying of confidential documents | Koichi Aota, Katsuhiko Ishikawa | 1986-08-05 |
| 4544936 | Heat-sensitive recording sheet | — | 1985-10-01 |