Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9583330 | Supercritical drying method for semiconductor substrate and supercritical drying apparatus | Hidekazu Hayashi, Hiroshi Tomita, Hisashi Okuchi, Yohei Sato, Takayuki Toshima +5 more | 2017-02-28 |
| 9570286 | Supercritical drying method for semiconductor substrate | Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Hidekazu Hayashi | 2017-02-14 |
| 8961696 | Method and device for cleaning semiconductor substrate | Hiroshi Tomita, Minako Inukai, Hiaashi Okuchi | 2015-02-24 |
| 8950082 | Supercritical drying method for semiconductor substrate | Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Hidekazu Hayashi | 2015-02-10 |
| 8771429 | Supercritical drying method for semiconductor substrate and supercritical drying apparatus | Hidekazu Hayashi, Hiroshi Tomita, Hisashi Okuchi, Yohei Sato, Takayuki Toshima +5 more | 2014-07-08 |
| 8567420 | Cleaning apparatus for semiconductor wafer | Minako Inukai, Hiroshi Tomita, Kaori Umezawa, Yasuhito Yoshimizu | 2013-10-29 |
| 7985683 | Method of treating a semiconductor substrate | Hiroshi Tomita, Tatsuhiko Koide, Hisashi Okuchi, Kentaro Shimayama, Hiroyasu Iimori | 2011-07-26 |
| 7838425 | Method of treating surface of semiconductor substrate | Hiroshi Tomita, Hiroyasu Iimori, Hisashi Okuchi, Tatsuhiko Koide | 2010-11-23 |
| 7749909 | Method of treating a semiconductor substrate | Hiroshi Tomita, Tatsuhiko Koide, Hisashi Okuchi, Kentaro Shimayama, Hiroyasu Iimori | 2010-07-06 |