Issued Patents All Time
Showing 26–50 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9095953 | Apparatus for polishing rear surface of substrate, system for polishing rear surface of substrate, method for polishing rear surface of substrate and recording medium having program for polishing rear surface of substrate | Mitsunori Nakamori, Noritaka Uchida, Takanori Miyazaki, Nobuhiko Mouri | 2015-08-04 |
| 8978671 | Substrate processing method and substrate processing apparatus | Satoru Tanaka, Hirotaka Maruyama, Teruomi Minami, Mitsunori Nakamori | 2015-03-17 |
| 8969218 | Etching method, etching apparatus and storage medium | Tsukasa Watanabe, Keisuke Egashira, Miyako Kaneko | 2015-03-03 |
| 8794250 | Substrate processing method and substrate processing apparatus | Kenji Sekiguchi, Noritaka Uchida, Satoru Tanaka, Hiroki Ohno | 2014-08-05 |
| 8770138 | Semiconductor manufacturing apparatus and semiconductor manufacturing method | Kenichi Hara, Mitsuaki Iwashita, Takashi Tanaka, Takayuki Toshima | 2014-07-08 |
| 8771429 | Supercritical drying method for semiconductor substrate and supercritical drying apparatus | Linan Ji, Hidekazu Hayashi, Hiroshi Tomita, Hisashi Okuchi, Yohei Sato +5 more | 2014-07-08 |
| 8747689 | Liquid processing method, liquid processing apparatus and storage medium | Hiroki Ohno | 2014-06-10 |
| 8741070 | Liquid processing method, liquid processing apparatus and recording medium | Nobutaka Mizutani, Tsutae Omori, Akira Fujita | 2014-06-03 |
| 8651121 | Substrate processing apparatus, substrate processing method, and storage medium | Kenji Sekiguchi | 2014-02-18 |
| 8372212 | Supercritical drying method and apparatus for semiconductor substrates | Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Hidekazu Hayashi, Yukiko Kitajima +5 more | 2013-02-12 |
| 8337659 | Substrate processing method and substrate processing apparatus | Kenji Sekiguchi, Noritaka Uchida, Satoru Tanaka, Hiroki Ohno | 2012-12-25 |
| 8113221 | Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium | Hiromitsu Nanba, Takashi Yabuta | 2012-02-14 |
| 8003509 | Semiconductor manufacturing apparatus and semiconductor manufacturing method | Kenichi Hara, Mitsuaki Iwashita, Takashi Tanaka, Takayuki Toshima | 2011-08-23 |
| 7927429 | Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium | Hiromitsu Nanba, Takashi Yabuta | 2011-04-19 |
| 7862680 | Substrate processing apparatus | Tatsuya Nishida, Osamu Kuroda | 2011-01-04 |
| 7803230 | Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method | Masaru Amai, Kenji Sekiguchi, Hiroki Ohno, Satoru Tanaka, Takuya Mori | 2010-09-28 |
| 7767006 | Ozone processing apparatus and ozone processing method | Yoshichika Tokuno, Norihiro Ito, Mitsunori Nakamori, Tadashi Iino, Hiroki Ohno +1 more | 2010-08-03 |
| 7731799 | Substrate processing method, substrate processing apparatus and computer-readable memory medium | Takayuki Toshima, Tadashi Iino, Yusuke Saito, Mitsunori Nakamori, Noritaka Uchida | 2010-06-08 |
| 7691210 | Resist film removing method | Kenji Sekiguchi, Tadashi Iino | 2010-04-06 |
| 7693597 | Computer readable storage medium for controlling substrate processing apparatus | Mitsunori Nakamori, Tadashi Iino, Noritaka Uchida | 2010-04-06 |
| 7543593 | Substrate processing apparatus | Tatsuya Nishida, Osamu Kuroda | 2009-06-09 |
| 7482281 | Substrate processing method | Yasushi Fujii, Takayuki Toshima | 2009-01-27 |
| 7416632 | Substrate processing apparatus and substrate processing method | Masaru Amai | 2008-08-26 |
| 7404407 | Substrate processing apparatus | Osamu Kuroda | 2008-07-29 |
| 7402523 | Etching method | Eiichi Nishimura | 2008-07-22 |