Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11676847 | Substrate placing table and substrate processing apparatus | Satoshi Taga, Naoyuki Satoh | 2023-06-13 |
| 11508603 | Substrate placing table and substrate processing apparatus | Satoshi Taga, Naoyuki Satoh | 2022-11-22 |
| 11217470 | Substrate placing table and substrate processing apparatus | Satoshi Taga, Naoyuki Satoh | 2022-01-04 |
| 8569186 | Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device | Masayuki Kohno, Toshio Nakanishi | 2013-10-29 |
| 8366953 | Plasma cleaning method and plasma CVD method | Masayuki Kohno, Toshio Nakanishi | 2013-02-05 |
| 8329596 | Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device | Masayuki Kohno, Toshio Nakanishi | 2012-12-11 |
| 8318614 | Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatus | Masayuki Kohno, Toshio Nakanishi, Yoshihiro Hirota | 2012-11-27 |
| 8258571 | MOS semiconductor memory device having charge storage region formed from stack of insulating films | Tetsuo Endoh, Masayuki Kohno, Minoru Honda, Toshio Nakanishi, Yoshihiro Hirota | 2012-09-04 |
| 8138103 | Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device | Masayuki Kohno, Toshio Nakanishi | 2012-03-20 |
| 8119545 | Forming a silicon nitride film by plasma CVD | Minoru Honda, Toshio Nakanishi, Masayuki Kohno, Junya Miyahara | 2012-02-21 |
| 8114790 | Plasma CVD method, silicon nitride film formation method, semiconductor device manufacturing method, and plasma CVD apparatus | Masayuki Kohno, Toshio Nakanishi | 2012-02-14 |
| 7915177 | Method of forming gate insulation film, semiconductor device, and computer recording medium | Shuuichi Ishizuka, Yutaka Fujino, Toshio Nakanishi, Yoshihiro Sato | 2011-03-29 |
| 7674722 | Method of forming gate insulating film, semiconductor device and computer recording medium | Shuuichi Ishizuka, Yutaka Fujino, Toshio Nakanishi, Yoshihiro Sato | 2010-03-09 |
| 7304002 | Method of oxidizing member to be treated | Tsukasa Yonekawa, Keisuke Suzuki, Toru Sato | 2007-12-04 |
| 7156923 | Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method | Hitoshi Kato, Kohei Fukushima, Atsushi Endo, Takeshi Kumagai | 2007-01-02 |
| 6844273 | Precleaning method of precleaning a silicon nitride film forming system | Hitoshi Kato, Kohei Fukushima, Atsushi Endo, Takeshi Kumagai | 2005-01-18 |