KF

Kohei Fukushima

TL Tokyo Electron Limited: 21 patents #248 of 5,567Top 5%
Honda Motor Co.: 1 patents #12,035 of 21,052Top 60%
📍 Iwate, JP: #13 of 263 inventorsTop 5%
Overall (All Time): #189,302 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
12281389 Substrate processing method and substrate processing apparatus 2025-04-22
12054828 Substrate processing method and substrate processing apparatus 2024-08-06
11560628 Substrate processing method and substrate processing apparatus 2023-01-24
11282721 Vertical heat treatment apparatus Hiroki IRIUDA 2022-03-22
11208721 Substrate processing apparatus Tsuneyuki Okabe 2021-12-28
10475641 Substrate processing apparatus Hiromi Nitadori 2019-11-12
10287682 Substrate processing apparatus, gas supply method, substrate processing method, and film forming method Kazuyuki Kikuchi, Tsuneyuki Okabe 2019-05-14
9970111 Substrate processing apparatus having ground electrode Hiroyuki Matsuura, Yutaka Motoyama, Koichi Shimada, Takeshi Ando 2018-05-15
9789579 Apparatus for detecting rammer tip-over Takamasa Takeshige, Yasunori Matsubara 2017-10-17
9776202 Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatus Yutaka Motoyama, Keisuke Suzuki, Shingo Hishiya 2017-10-03
D786810 Dummy wafer Yutaka Motoyama 2017-05-16
D785576 Dummy wafer Yutaka Motoyama 2017-05-02
D784937 Dummy wafer Yutaka Motoyama 2017-04-25
9624579 Film forming apparatus, film forming method, and non-transitory computer-readable storage medium 2017-04-18
9487859 Operating method of vertical heat treatment apparatus, storage medium, and vertical heat treatment apparatus Yutaka Motoyama, Keisuke Suzuki, Hiromi Takahashi 2016-11-08
8608902 Plasma processing apparatus Toshiki Takahashi, Hiroyuki Matsuura, Yutaka Motoyama, Kazuya Yamamoto 2013-12-17
8336490 Plasma processing apparatus Hiroyuki Matsuura, Toshiki Takahashi 2012-12-25
7825039 Vertical plasma processing method for forming silicon containing film Toshiki Takahashi, Koichi Orito, Jun Sato 2010-11-02
7758920 Method and apparatus for forming silicon-containing insulating film Kazuhide Hasebe, Mitsuhiro Okada, Pao-Hwa Chou, Jun Ogawa, Chaeho Kim +2 more 2010-07-20
7462376 CVD method for forming silicon nitride film Hitoshi Kato, Masato Yonezawa, Junya Hiraka 2008-12-09
7156923 Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method Hitoshi Kato, Atsushi Endo, Tatsuo Nishita, Takeshi Kumagai 2007-01-02
6844273 Precleaning method of precleaning a silicon nitride film forming system Hitoshi Kato, Atsushi Endo, Tatsuo Nishita, Takeshi Kumagai 2005-01-18